The created experimental magnetron sputtering system allows preliminary cleaning of the substrate surface and subsequent deposition coatings on long cylindrical products within a single using coaxial discharge at working gas pressure 150 mTorr. coating has reverse electrodes polarity relative to discharge. A theoretical calculation parameters been carried out.

a cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. the substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. the al/ cu multilayer film was deposited on the glass substrate at the following conditions: working g...

Low-temperature and low-pressure plasma was investigated by OES (optical emission spectroscopy) in the range 200–1100 nm. For displaying measured emission spectra and identification of spectrum lines the software Spectrum Analyzer was used. Two modes of glow discharge present in the DC cylindrical magnetron apparatus which were previously researched by a mass spectrometer were studied by OES. T...