The influence of the aluminum nitride (AlN) film texture on the chemical etching in KOH solution was invested. The AlN films with the different texture and crystal quality were prepared by sputtering. It is found that the chemical etching behaviors, including the etch rate, the activation energy, the surface morphology and the anisotropy, are strongly dependent on the film texture. There is a f...

for a fiber optical surface plasmon resonance (spr) sensor a short part of its cladding should be removed to coat a thin layer of a metal. usually this is problematic when an optical fiber with small core diameter is used. in this paper, a new method using µliter droplet of the hf acid for short fiber optical taper fabrication is reported. using this method in a multi-mode optical fiber with th...

In this treatment method laser radiation, which is guided from a co-axially expanding liquid jet-stream, locally initiates on a metal surface a thermochemical etching reaction, which leads to selective material removal. Time-resolved measurements of the electrical potential were correlated with the specific processing parameters to identify conditions for stable and enhanced chemical etching re...

In this paper, we present result on the development of a simulation tool for the three-dimensional anisotropic wet chemical etching of bulk silicon etching or bulk micromaching. As a test of our simulation tool, we present several simulation results. Several simulation results demonstrate our simulation tool which is quite efficient for the design and development of MEMS device structure. The d...

In this experimental work, by using the method of plasma-chemical etching, we have dealt with the causes of the creation of a distorted layer on the surface of silicon wafers during mechanical machining processes, in addition, the elucidation of connections between the structure of this layer and characteristic parameters of the mechanical strength of these wafers have been studied. Experimenta...

Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a cert...

This paper presents the fabrication and characterisation of wet and reactive ion etched ridge waveguide InGaAs/InGaAsP/InP lasers with an operating wavelength of 1.5μm. Characterisation results of InGaAs/InGaAsP/InP lasers are given of two etching methods, namely wet chemical etching and reactive ion etching. Relative advantages and disadvantages of these two methods are also discussed comparat...

In many electronic applications, chemical etching process is used to manufacture the substrates. This method has been applied for long on quartz crystal blanks manufacturing for minor adjustments of the vibration frequencies. This paper pesents a way to implement an industrial chemical etching process specially dedicated for large thickness removals without damaging the blanks surface texture. ...

Etching egg shells with naturally acidic solutions is a traditional method of Easter eggs decorating. This technique, using only substances that are legally classified as food, easy to proceed and makes it possible demonstrate some basic chemical principles (such reaction between acid salt; the influence time temperature on course reaction).