In the interest of a more thorough understanding of the relationship between sample deposition technique and the quality of data obtained using matrix-assisted laser desorption/ionization (MALDI) mass spectrometry, details of the electrospray (ES) process of sample deposition are investigated using a number of techniques. Sample morphology was observed with scanning electron microscopy (SEM) an...

In plasma-assisted deposition methods the activation energy necessary for the initiation of chemical reactions is transferred via charged particles. Due to this fact in many cases the process temperature can be kept small, if gas discharges at pressures below 1 hPa are used. On the other hand low pressure requires a great deal of vacuum equipment. Processes at atmospheric pressure are more favo...

DOI: 10.1002/admi.201500762 temperature, and solution processability makes it possible for the realization of a high throughput, roll-to-roll production process of high effi ciency photovoltaics, thus ending the gap between academic prototypes and industrial standards. While the prospect of harnessing these advantageous properties makes perovskites ideal candidates for next generation solar cel...

Plasma-assisted thermal chemical vapor deposition (CVD) was carried out to synthesize high-quality graphene film at a low temperature of 600°C. Monolayer graphene films were thus synthesized on Cu foil using various ratios of hydrogen and methane in a gaseous mixture. The in situ plasma emission spectrum was measured to elucidate the mechanism of graphene growth in a plasma-assisted thermal CVD...

A new method of synthesising nanoparticle-functionalised nanostructured materials via Aerosol Assisted Chemical Vapour Deposition (AACVD) has been developed. Co-deposition of Au nanoparticles with WO(3) nanoneedles has been used to deposit a sensing layer directly onto gas sensor substrates providing devices with a six-fold increase in response to low concentrations of a test analyte (ethanol).

The execution of special hydrogen diffusion experiments requires an initially hydrogen-free drain layer. Hydrogen-free amorphous silicon (a-Si) deposited by radio frequency magnetron sputter deposition (RFSD) serves this purpose. RFSD yields a rough surface of the film but this can be flattened by an additional post-hydrogenation step. Weak Si-Si bonds are reorganized by hydrogen and the surfac...