نتایج جستجو برای: acid etchant

تعداد نتایج: 747686  

Journal: :Journal of dentistry 2006
K L Van Landuyt P Kanumilli J De Munck M Peumans P Lambrechts B Van Meerbeek

UNLABELLED The self-etch approach provides dentists with a generation of user-friendly and less technique-sensitive adhesives. Nevertheless, some concern has been raised regarding their bonding effectiveness to enamel, in particular when so-called 'mild' self-etch adhesives are employed. OBJECTIVES The purpose of this study was to test the hypothesis that the two-step self-etch adhesive Clear...

Journal: :Dental Materials Journal 2021

In this study, the influence of primer contamination on enamel bonding was analyzed. Adper Scotchbond Multi-Purpose (SMP), CLEARFIL SE Bond 2 (SE2), Universal (SBU) Adhesive, and Etchant (35% phosphoric acid; PA) were used. Ground bovine enamels divided into eight groups based protocols. The interfaces after an acid-base challenge observed via scanning electron microscopy to determine resistant...

2015
Fereshteh Shafiei Sahar Akbarian Mohammad Karim Etminan

Background and aims. Nano-ionomer (NI) interacts with tooth structures superficially, and there is a concern about the enamel bonding ability of mild self-etch Ketac primer. This study compared the effect of different adhesive procedures (self-etching and etch-and-rinse approach) on long-term marginal microleakage of nano-filled resin-modified glass-ionomer (NI) cervical restorations. Materials...

2016
M. Vega M. S. Perez P. Granell F. Golmar C. Wloka G. Maglia M. J. Dieguez E. M. Del Valle C. Lasorsa

The objective of this study was to demonstrate the possibility of using 1-butanol to reliably detect the open-pore current of pyramidal solid-state nanopores produced in silicon wafers. The nanopores were produced through controlled pore formation by neutralizing an etchant (KOH) with a strong acid (HCl). Since nanopores produced by this method are deeper than those made in nanometerthick membr...

2017
Hidetaka Asoh Ryota Imai Hideki Hashimoto

GaAs nanopillar arrays were successfully fabricated by metal-assisted chemical etching using Au nanodot arrays. The nanodot arrays were formed on substrates by vacuum deposition through a porous alumina mask with an ordered array of openings. By using an etchant with a high acid concentration and low oxidant concentration at a relatively low temperature, the area surrounding the Au/GaAs interfa...

Journal: :Coatings 2022

Superhydrophobic surfaces were prepared using a two-step method that involved the etching of AZ31 and AZ91 magnesium alloys then modifying etched with stearic acid. Magnesium ZnCl2 SnCl2 exhibited roughened micro- nanoscale hierarchical structures consisting two chemically distinct regions (Zn/Zn(OH)2 or Sn/SnO2 Mg(OH)2). An optimum time ten minutes was chosen for both etchants. highest contact...

Journal: :Materials Today: Proceedings 2021

We report a simple and efficient silicon wet etchant HNA (Hydrofluoric acid, Nitric Acetic acid) for the stiction free release of nitride/metal micro/nanomechanical structures. The concentration was varied with aim developing slow etch rate, which could be utilized to suspend micron sub-micron cantilever fixed beam rate found decrease in HF increase HNO3 concentrations. Smooth surface high sele...

Journal: :International Journal of Dental Materials 2021

Background: Repair of direct composites are less invasive than replacement, diminishing the risk iatrogenic exposure pulp and detrimental to adjacent teeth, all in all, reducing procession “restoration death spiral”. Aim: This study aimed evaluate repair bond strength aged resin using different surface treatments bonding protocols. Materials Methods: A total 45 discs (n=45) were fabricated Nano...

2014
R. C. Pearce W. C. Wu D. K. Hensley J. B. Tracy T. E. McKnight A. V. Melechko

Vertically-aligned carbon nanofibres (VACNFs) have been synthesized in a mixture of acetone and air using catalytic DC plasma-enhanced chemical vapour deposition. Typically, ammonia or hydrogen is used as an etchant gas in the mixture to remove carbon that otherwise passivates the catalyst surface and impedes growth. Our demonstration of the use of air as the etchant gas opens up the possibilit...

1995
Brett Warneke Eric Hoffman Kristofer S.J. Pister

Using a single maskless postprocessing step we have developed an accelerometer in a standard commercial CMOS process capable of a sensitive axis parallel or perpendicular to the die surface. Our postprocess is realized using xenon difluoride (XeF2) as a bulk etchant. The combination of this etchant and the standard CMOS process allows realization of cantilevers with piezoresistive sensors in al...

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