Thin films of SiO2–TiO2 composite oxides with various SiO2:TiO2 compositions were prepared by the sol-gel method, using tetraethylorthosilicate (TEOS) and titanium tetraisopropoxide (TTIP) as precursors. The composition, crystal structure, and chemical bonding configuration of the as-deposited and annealed SiO2–TiO2 thin films were analyzed using Rutherford backscattering spectrometry (RBS), gl...

In this study, the silicon dioxide was deposited on the silicon substrate by metal-organic based plasma enhanced chemical vapor deposition (PECVD) method at the low temperature. The metal-organic tetraethoxy-silane (TEOS) was used as a silicon precursor in liquid state. In addition, oxygen and argon were used as ambient gases. Effects of the working pressure and O2/TEOS pressure ratio on the ch...

Halide-permeable xerogel films prepared from sols containing 50 mol% aminopropyltriethoxysilane (APTES)/50 mol% tetraethoxysilane (TEOS) or 10 mol% APTES/90 mol% TEOS and 0.015 M selenoxide or telluride catalyst in the sol gave reduced settlement of cypris larvae of the barnacle Balanus amphitrite and larvae of the tubeworm Hydroides elegans in the presence of artificial seawater (ASW) and hydr...

A series of poly(dimethyl siloxane) (PDMS)/silica nanocomposites were synthesized utilizing a sol gel method. The samples were evaluated using pseudobarnacle adhesion and tensile strength tests. The effects of the molecular weight of the PDMS and the size and structure of the silica domains on biofouling release and the mechanical behavior of the PDMS/silica materials were investigated. Three d...

The study evaluated copper, boron, and silicon release from wood samples treated with sol-gel formulations based on tetraethoxysilane (TEOS) and 3aminopropyltriethoxysilane (APTES) functionalized with copper (II) chloride and boric acid, respectively. The adopted leaching procedure was Japanese protocol JIS K 1571 (2004). Inductively Coupled Plasma Atomic Emission Spectroscopy (ICP-AES) and Ele...

Ozone/TEOS thermal chemical vapor deposition ~CVD! has been investigated for SiO2 deposition on Si, using a cold-wall research reactor equipped to determine the effects of precursor concentration, deposition temperature ~300–500 °C!, and pressure ~30–200 Torr! on deposition rates, etch rates, and step coverage in the regime of subatmospheric CVD ~SACVD!. Deposition rates first increase with sub...

Highly monodisperse 1,3-phenylene-bridged hybrid organosilica spheres (m-PHS) were synthesized by co-condensation of tetraethoxysilane (TEOS) and 1,3-bis(triethoxysilyl)benzene (1,3-BTEB) using dodecylamine (DDA) and cetyltrimethylammonium bromide (CTAB) as templates. In this method, three important factors are the surfactants, the ethanol–water volume ratio and the TEOS/1,3-BTEB molar ratio. T...