نتایج جستجو برای: total etch system

تعداد نتایج: 2910034  

Journal: :Annals of palliative medicine 2021

Background: To evaluate the clinical performance of universal adhesives in etch-and-rinse or self-etch application modes through meta-analysis.

2005
M. Elwenspoek

A new model is proposed that explains the anisotropy of the etch rate of single crystalline silicon in certain etchants. It is inspired from theories of crystal growth. We assume that the ( l l l ) face is flat on an atomic scale. Then the etch rate should be governed by a nucleation barrier of one atomic layer deep cavities. The origin of the nucleation barrier is that the formation of a too s...

Journal: :Pediatric dentistry 2002
Edward J Swift

This paper describes the development of dentin bonding systems, and describes the current strategies for bonding composite resin materials to dentin. Two main strategies are available--total-etch or self-etch--and each has unique advantages and disadvantages. For each category, simplified systems that reduce the number of application steps are available. Currently, the market is moving towards ...

Journal: :Applied sciences 2023

The aim of this study was to investigate the effect preceded tumor therapeutic irradiation on tensile bond strength three modern universal adhesives applied in self-etch mode dentin. Specimens prepared from 135 extracted human third molars were divided into superior groups. These received either no radiation, 5 Gy, or a total dose 60 Gy vitro irradiation, fractionally applied. samples each grou...

2017
Fabrizio Lorenzoni e Silva Saulo Pamato Milton-Carlos Kuga Marcus-Vinicius-Reis Só Jefferson-Ricardo Pereira

BACKGROUND To assess the immediate bond strength of a dual-cure adhesive resin cement to the hybridized dentin with different bonding systems. MATERIAL AND METHODS Fifty-six healthy human molars were randomly divided into 7 groups (n=8). After 3 longitudinal sections, the central cuts were included in PVC matrix and were submitted to dentin hybridization according to the groups: G1 - etch & r...

Journal: :Dental materials journal 2012
Iranzihuatl Torres-Gallegos Gabriel A Martinez-Castañon Juan-Pablo Loyola-Rodriguez Nuria Patiño-Marin Armando Encinas Facundo Ruiz Kenneth Anusavice

The aim of this study was to evaluate the bond strength of three adhesive systems: Excite™, Adper Prompt L-Pop™ and AdheSE One™ to varying degrees of fluorotic enamel using micro-tensile bond strength (μTBS) tests. Human enamel was classified according to the Thylstrup and Fejerskov Index. The interface resin-enamel was observed using stereoscopic and electron microscopy. The Excite™, achieved ...

Journal: :مجله دندانپزشکی جامعه اسلامی دندانپزشکان 0
دکتر مهشید محمدی بصیر mahshid mohammadibasir دکتر الهه سید طبایی elahe seyed tabaii

the effect of 6-month water storage on microleakage of two-component self-etch adhesive systems      dr. mohammadibasir m .,1 dr. seyed tabaii e .2   1 assistant professor, department of operative dentistry , school of dentistry, shahed university. tehran , iran.   2 dentist.     (received 5 dec, 2010 accepted 14 april, 2011)     abstract     background and aim : simplification of the self-etch...

Journal: :Journal of nanoscience and nanotechnology 2011
Eun Ho Kim Yu Bin Xiao Seon Mi Kong Chee Won Chung

The etch characteristics of CoFeB magnetic films and magnetic-tunnel-junction (MTJ) stacks masked with Ti films were investigated using an inductively coupled plasma reactive ion etching in a HBr/Ar gas mix. The etch rate, etch selectivity, and etch profile of the CoFeB films were obtained as a function of the HBr concentration. As the HBr gas was added to Ar, the etch rate of the CoFeB films, ...

Journal: :Journal of prosthodontics : official journal of the American College of Prosthodontists 2010
Jylan El Guindy Manar Y Fouda

PURPOSE The aim of this study was to assess the role of obturating systems, dowel materials, and adhesive techniques on the resistance to fracture of endodontically treated teeth. MATERIAL AND METHODS Eighty maxillary central incisors were selected and randomly divided into two groups according to the obturating system (n = 40); group I: gutta-percha and Roeko sealer; group II: RealSeal. Both...

1995
M. L. Brake J. T. P. Pender M. J. Buie A. Ricci J. Soniker P. D. Pochan P. A. Miller

This paper describes the results of using the GEC reference cell as a reactive ion etcher. Silicon wafers with layers of polysilicon and silicon dioxide on crystaline silicon patterned with photoresist have been investigated with fluorine and chlorine chemistries. Scanning electron microscopy (SEM), profilometry, and refraction techniques were used to determine the etch parameters such as etch ...

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