We discuss a custom built hybrid physical chemical vapour deposition (HPCVD) system for MgB2 ultra-thin film deposition: construction, deposition process development, and optimization. Achieved films on SiC substrates have a critical temperature (Tc) ranging from 35K (10nm thick films) to 41K (40nm thick films). The 20nm thick unpatterned film had a room temperature resistivity of 13μΩ·cm, wher...

Among physical vapor deposition techniques thermal evaporation (TE) is the one with the longest standing tradition. However, during the last 30 years of booming semiconductor industry which involves a great deal of thin film technology, deposition techniques like CVD (chemical vapor deposition) or sputtering which often offer unquestionable advantages have been developed to perfection and TE ha...

Vapor-phase synthesis techniques of polymeric nanostructures offer unique advantages over conventional, solution-based techniques because of their solventless nature. In this work, we report the fabrication of coaxial polymer nanotubes using two different chemical vapor deposition methods. The fabrication process involves the deposition of an outer layer of the conductive polyaniline (PANI) by ...

In this paper we review and provide an overview to the understanding of the chemical vapor deposition (CVD) of diamond materials with a particular focus on the commonly used microwave plasma-activated chemical vapor deposition (MPCVD). The major topics covered are experimental measurements in situ to diamond CVD reactors, and MPCVD in particular, coupled with models of the gas phase chemical an...