نتایج جستجو برای: plasma deposition

تعداد نتایج: 439546  

2010
J. Geiser V. Buck Jian Liao

In this paper, we present a simulation of chemical vapor deposition with metallic bipolar plates. In chemical vapor deposition, a delicate optimization between temperature, pressure and plasma power is important to obtain homogeneous deposition. The aim is to reduce the number of real-life experiments in a given CVD plasma reactor. Based on the large physical parameter space, there are a hugh n...

2006
P. Brault S. Roualdès A. Caillard A.-L. Thomann J. Mathias J. Durand C. Coutanceau J.-M. Léger R. Boswell

In this review, we report on the use of low pressure plasmas for elaborating materials at the heart of solid polymer fuel cells (SPFC), especially electrodes and the membrane electrolyte. Electrodes are formed using plasma sputtering techniques while the ion conducting membranes are built up using plasma polymerization. Fuel cell performance will be improved by these approaches. The electrode c...

2006
Jiesheng Wang Yoke Khin Yap

Previously, in situ bombardment of massive ions (Ar, Kr, etc.) was considered to be necessary for the formation of c-BN films. Because of the accumulated stress, bombardment of massive ions has led to the formation of c-BN films with poor adhesion. Here we show that c-BN films can be grown without involving bombardment of massive ions. This is achieved by using plasma-assisted pulsed-laser depo...

2010
Burak Caglar Enric Bertran Eric Jover

Plasma enhanced chemical vapor deposition (PECVD) is a versatile technique to obtain vertically densealigned carbon nanotubes (CNTs) at lower temperatures than chemical vapor deposition (CVD). In this work, we used magnetron sputtering to deposit iron layer as a catalyst on silicon wafers. After that, radio frequency (rf) assisted PECVD reactor was used to grow CNTs. They were treated with wate...

2013
M. Fonrodona D. Soler J. Bertomeu J. Andreu

Hydrogenated amorphous and nanocrystalline silicon, deposited by catalytic chemical vapour deposition, have been doped during deposition by the addition of diborane and phosphine in the feed gas, with concentrations in the range of 1%. The crystalline fraction, dopant concentration and electrical properties of the films are studied. The nanocrystalline films exhibited a high doping efficiency, ...

Journal: :International Journal of Nanomedicine 2007
Chang Yao Dan Storey Thomas J Webster

Bioactive coatings are in high demand to increase the functions of cells for numerous medical devices. The objective of this in vitro study was to characterize osteoblast (bone-forming cell) adhesion on several potential orthopedic polymeric materials (specifically, polyetheretherketone, ultra-high molecular weight polyethylene, and polytetrafluoroethylene) coated with either titanium or gold u...

2011
Zihao Ouyang Liang Meng Priya Raman Tae S Cho D N Ruzic

A laser-assisted plasma-coating technique at atmospheric pressure (LAPCAP) has been investigated. The electron temperature, electron density and gas temperature of the atmospheric-pressure plasma have been measured using optical emission spectroscopy (OES). LAPCAP utilizes laser ablation of 3 mol% yttria-stabilized zirconia into an atmospheric helium/nitrogen plasma to deposit thermal barrier c...

1996
C. Charles R. W. Boswell H. Kuwahara

Near-stoichiometric SiO2 films, with little H incorporation and wet etch rates 1.5–3 times that of thermal oxide, have been deposited in a low pressure oxygen/silane helicon diffusion plasma, which has been pulsed with a 50% duty cycle at frequencies from 0.005 Hz to 1 kHz. At low pulse frequencies, the deposition rate is about 50% of the continuous rate, but as the pulse frequency increases fr...

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