To increase the tool life of fine blanking punches, this work investigates a combined solution approach consisting increasing mechanical strength substrate material by shot peening and deposition physical vapor (PVD) hard coatings. A powder metallurgical high-speed steel (HSS) is used as material. First, temperature-dependent relaxation behavior residual stresses strain-hardening shot-peened an...

In this paper, we present the results of a study of TiN thin fi lms which are deposited by a Physical Vapour Deposition (PVD) and Ion Beam Assisted Deposition (IBAD). In the present investigation the subsequent ion implantation was provided with N2+ ions. The ion implantation was applied to enhance the mechanical properties of surface. The thin fi lm deposition process exerts a number of eff ec...

Abstract For more than 6 decades, thermal barrier coatings have been used to protect structural parts in both stationary and aviation gas turbines. These allow the use of significant higher operation temperatures hence increased efficiencies. In 1970s, yttria-stabilized zirconia (YSZ) was identified as outstanding material for this application. As major deposition technologies electron beam phy...

PbTiO3 (PTO) suffers from difficulty in preparing high-density robust bulk ceramics, which turn has been a bottleneck thin films growth with physical vapor deposition (PVD) methods. In the present work, we prepared non-doped PTO by pulsed laser (PLD) method either single target or mosaic consisting of PbO and TiO2 pie-shaped pieces. On target, irradiation caused selective ablation Pb, resulting...

In–situ cleaning of the substrate surface by ion etching is an integral part all physical vapor deposition (PVD) processes. However, in industrial systems, some side effects occur during process that can cause re-contamination. For example, a magnetron sputtering system with several sputter sources and holder located centered between them, causes contamination unshielded target surfaces batchin...

At present the processes of chemical vapour deposition (MO CVD) and physical vapour deposition (PVD) are widely used to obtain the layers of different materials. A possibility to obtain materials of the required composition (elementary, complex, composite, etc.) is determined by the chemical nature of a precursor. By now a set of criteria for the precursors to meet the MO CVD and PVD standards ...