نتایج جستجو برای: metal vapor lamp
تعداد نتایج: 240016 فیلتر نتایج به سال:
The ability to protect refined metals from reactive environments is vital to many industrial and academic applications. Current solutions, however, typically introduce several negative effects, including increased thickness and changes in the metal physical properties. In this paper, we demonstrate for the first time the ability of graphene films grown by chemical vapor deposition to protect th...
IMALION which stands for IMplantation of ALuminum IONs is a facility designed for high-current metal ion beam implantation and surface modification such as in semiconductor, medical or optical industry. IMALION is a newly developed 30 kV metal ion wide area implantation platform, which is suitable for the irradiation of a target width of 200 mm to produce homogeneous implantation profiles over ...
Ionized physical vapor deposition (IPVD) is a new method for depositing metal into high-aspect-ratio features used as interconnects in microelectronic fabrication. It is similar to sputtering except that a portion of the metal flux to the substrate is ionized. We show how a high ionized-metal-flux fraction (IMFF) at the deposition location improves the bottom coverage of deposited metal films. ...
This study determined the hardness and curing depth of a light-activated indirect composite polymerized with three laboratory light-polymerizing units for the purpose of comparing the curing performance of the three units. A light-activated composite material for indirect application (Vita Zeta) was polymerized with three light-polymerizing units equipped with the following light sources: 1) on...
Abstract Vapochromism, a phenomenon in which the color or luminescence of substance changes response to gaseous molecules, has potential for developing sensor materials detect harmful substances environment. In addition, vapochromism is scientifically interesting direct visualization interactions between gases and solids. The crystals metal complexes involve diverse flexible electronic interact...
The fundamental surface chemistry underlying selectivity in copper chemical vapor deposition (CVD) from COD-Cu-hfac and Cu(hfac), has been determined. Both electronic and chemistry contributions strongly influence the precursor reactivity on oxide as compared to metal surfaces. These results have important implications regarding the role of surface preparation and cleaning for initiating and ma...
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