In this research, we modeled a silicon-based photodetector for the NIR-IR spectrum using grating structure fabricated metal-assisted chemical etching method. A nanostructure by method is free of defects such as unwanted sidewall metal depositions. The device simulated Lumerical finite difference time domain (FDTD) optical characteristics and CHARGE electrical characteristics. First, optimized d...

An innovative and versatile nanofabrication technique based on template assisted three-dimensional (3D) nanolithography is presented that takes advantage of the irreversibility of conformal growth and conformal etching at locations with negative surface curvatures in 3D templates. Using colloidal crystals as templates, nanoring particles are generated with quantity much higher than conventional...

The successful synthesis of carbon nanotubes has stimulated much research in nanomaterials, in particular, in semiconducting nanostructures, which are interesting for their novel sizeand dimensionality-dependent physical properties, and their potential applications in nanoscale optoelectronics. Silicon is the most important semiconducting material, with its contemporary microelectronic technolo...

A catalytically assisted etching method, named Catalyst-Referred Etching (CARE) was applied to the planarization of Lithium Niobate (LN) surface, which is widely used for optical waveguides, modulators, piezoelectric applications. The study demonstrates that an atomically smooth surface with less than 0.1 nm root-mean-square roughness could be achieved on a LN substrate using thin metal film an...

Hard x-ray nanoimaging enables structural investigations of newmaterials for many applications. For high-resolution experiments, zone plate x-ray optics are commonly chosen. Two methods of zone plate nanofabrication are presented in this thesis. Zone plates are circular diffraction gratings with radially decreasing grating period. Their optical resolution depends on the width of the smallest zo...