: In this study, direct-current magnetron sputtering was used to fabricate Ti-doped indium tin oxide (ITO) thin films. The sputtering power during the 350-nm-thick thin-film production process was fixed at 100 W with substrate temperatures increasing from room temperature to 500 °C. The Ti-doped ITO thin films exhibited superior thin-film resistivity (1.5 × 10-⁴ Ω/cm), carrier concentration (4....

Variable filters are key components for compact spectral imagers. In this paper, we present a method the fabrication of linearly variable based on Bühler HELIOS machine (plasma assisted reactive magnetron sputtering). These obtained by producing variation thickness all layers coating, using adapted masks placed in between sputtering targets low and high refractive index materials substrates. ba...

FeNi films in circular shape with 3 mm diameter obtained by magnetron sputtering the presence of a constant magnetic field various configurations are studied. The created permanent magnet 1.2 mm, magnetization which is oriented perpendicular to plane substrate, leads formation vortex-like structure film, characterized diffuse domain walls. Keywords: thin films, induced anisotropy, structure, sp...

In this study we contribute towards establishing the process-microstructure relationships in thin films grown off-normally by ionized physical vapor deposition. High power impulse magnetron sputtering (HiPIMS) is used at various peak target powers and deposition rates to grow copper (Cu) and chromium (Cr) films from a cathode placed at an angle 90 degrees with respect to the substrate normal. F...

The two-dimensional layer of molybdenum disulfide (MoS2) exhibits promising prospects in the applications of optoelectronics and valleytronics. Herein, we report a successful new process for synthesizing wafer-scale MoS2 atomic layers on diverse substrates via magnetron sputtering. Spectroscopic and microscopic results reveal that these synthesized MoS2 layers are highly homogeneous and crystal...

AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resis...