The transition metal nitrides like titanium nitride exhibit very interesting color variation properties depending on the different plasma deposition conditions using cylindrical magnetron sputtering method. It is found in this deposition study that nitrogen partial pressure in the reactive gas discharge environment plays a significant role on the color variation of the film coatings on bell-met...

Time resolved Tunable Diode-Laser Absorption Spectroscopy (TD-LAS) measurements were performed on the argon metastable (Ar) level 3s3p(P°3/2)4s excited at 801.478 nm, in the dense plasma region in front of the magnetron target in a high power impulse magnetron sputtering (HiPIMS) discharge. From the Doppler profile the evolution of the temperature and density were derived during the pulse as we...

Non-stoichiometric ceria nanoparticles (NPs) were obtained by a gas aggregation source with a magnetron and were mass-selected with a quadrupole mass filter. By varying magnetron power, Ar gas flow, and the length of the aggregation tube, NPs with an average diameter of 6, 9, and 14 nm were synthesized and deposited onto a substrate, thus obtaining NP films. The morphology of the films was stud...

The article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO2thin films using dc dual magnetron (DM) sputtering in Ar + O2mixture on unheated glass substrates. The DM was operated in a bipolar asymmetric mode and was equipped with Ti(99.5) targets of 50 mm in diameter. The substrate surface temperature Tsurfmeasured by a thermostrip was less than 180 °C for all exp...

Ti1-xAlxN coated tools are commonly used in high-speed machining, where the cutting edge of an end-mill or insert is exposed to temperatures up to 1100 °C. Here, we investigate the effect of Yttrium addition on the thermal stability of Ti1-xAlxN coatings. Reactive DC magnetron sputtering of powder metallurgically prepared Ti0.50Al0.50, Ti0.49Al0.49Y0.02, and Ti0.46Al0.46Y0.08 targets result in ...

Physical synthesis employing magnetron sputtering and gas aggregation in a modified commercial source has been coupled with size-selection and ion soft landing to prepare bare nanoparticles on surfaces with controlled coverage, size, composition, and morphology. Employing atomic force microscopy (AFM) and scanning electron microscopy (SEM), it is demonstrated that the size and coverage of nanop...

The filling of deep vias and trenches with metal for interconnect layers in microelectronic devices requires anisotropic deposition techniques to avoid formation of voids. Ionized metal physical vapor deposition ~IMPVD! is a process which is being developed to address this need. In IMPVD, a magnetron sputter deposition source is augmented with a secondary plasma source with the goal of ionizing...

Today’s Microwave ovens are often equipped with inverterized MW generators; compared with old style appliances, the magnetron is no more driven by a bulky ferro-resonant power supply, but by an electronic inverter, lighter, more efficient and, moreover, able to modulate the MW power, at least to a certain extent. The electronic power supply is generally designed around a resonant inverter which...

Relativistic magnetron (RM) with all cavity-magnetron axial extraction (ACMAE) has attracted much attention, benefiting from its good performance. In this paper, RM ACMAE is generalized to a general case called azimuthal-periodic-cavity due the introduction of two structure parameters R and S, where indicates number cavities between in coupling waveguide S adjacent waveguides. The necessary con...