Immersion interferometric lithography has been applied successfully to semiconductor device applications, but its potential is not limited to this application only. This paper explores this imaging technology for the production of threedimensional nano-structures using a 193 nm excimer laser and immersion Talbot interferometric lithographic tool. The fabrication of 3-D photonic crystals for the...

Abstract Advances in direct laser writing to attain super-resolution are required improve fabrication performance and develop potential applications for nanophotonics. In this study, a novel technique using single-color peripheral photoinhibition lithography was developed the resolution of while preventing chromatic aberration characteristics conventional multicolor lithography, thus offering r...

Based on holographic interferometry technique, we develop an alternative method for micrometer-sized periodic structures design. The optical setup with 2D spatial light modulator for periodic structures generation is presented. It is shown that this innovative method made possible the rapid generation of periodic structures employing diffractive masks and phase modulation based on multiple beam...

Abstract Micro- and nanoscale structures produced on surfaces of metals, polymers, ceramics, glasses have many important applications in different fields such as engineering, medical, biological, etc. Laser ablation using ultrashort pulses has become the prominent technique for generating surface various functional applications. Ultrashort laser proved to be ideal producing with dimensions down...

Mask-Aligner and Stepper The typical emission spectrum of a mask aligner or stepper with Hg light source and without optical selective mirrors/filters contains g(wavelength 436 nm), h(405 nm) and i-line (365 nm) (fig. right-hand), with an iline intensity approx. 40 % of the total emission between 440 and 340 nm. The absorption spectrum (spectral sensitivity see next section) of AZ® and TI photo...