AIM – The aim of this study was to evaluate marginal sealing ability of newly introduced Dyad Flow with total etch & self-etch adhesive system at the coronal and apical margins of class V resin composite restorations. MethodsA standard class V cavity (3 mm mesiodistal width, 3 mm occlusogingival height, and 1.5 mm axial depth) was prepared on the buccal surface of freshly extracted sound human ...

This paper presents results of a systematic investigation to characterize the sealing of micromachined cavities using chemical vapor deposition (CVD) methods. We have designed and fabricated a large number and variety of surface-micromachined test structures with different etch-channel dimensions. Each cavity is then subjected to a number of sequential CVD deposition steps with incremental thic...

During the months preceding the etch release, I worked on several large-scale QA tasks using an computing grid, including rebuilds of all packages in Etch, piuparts runs on all packages in Etch, etc. This talk will briefly describe what was done and how, and then will discuss various directions for future improvements, including changes needed to run such tasks on a regular basis, and to make t...

The authors demonstrate the production of low loss enhanced index contrast waveguides by reactive ion etching of IPGTM polysiloxane thin films. The use of a silica mask and CHF3 /O2 etch gas led to large etch selectivity between the silica and IPGTM of !20 and etch rates of !100 nm /min. This work indicates that compact optical circuits could be successfully fabricated for telecommunication app...

In this work, the inductively coupled plasma etching technique was applied to etch the barium titanate thin film. A comparative study of etch characteristics of the barium titanate thin film has been investigated in fluorine-based (CF4/O2, C4F8/O2 and SF6/O2) plasmas. The etch rates were measured using focused ion beam in order to ensure the accuracy of measurement. The surface morphology of et...

Potassium hydroxide (KOH) etching of a patterned [100] oriented silicon wafer produces V-shaped etch pits. We demonstrate that the remaining thickness of silicon at the tip of the etch pit can be reduced to approximately 5 microm using an appropriately sized etch mask and optical feedback. Starting from such an etched chip, we have developed two different routes for fabricating 100 nm scale sli...

OBJECTIVE To evaluate the effectiveness in the formation of resin tags, adhesive lateral branches and hybrid layers of five adhesive systems, when bonding to dentine. MATERIAL AND METHODS Flat dentin surfaces from 25 molars were bonded with several adhesive systems according to the manufacturers' instructions. Composite build-ups were constructed incrementally with Tetric Ceram. The Specimens...

OBJECTIVE To compare postoperative sensitivity following composite restoration placed in supra gingival class-V cavities using self etch adhesive and total etch adhesive. STUDY DESIGN A randomized clinical trial. PLACE AND DURATION OF STUDY Operative Dentistry Department of Armed Forces Institute of Dentistry, Rawalpindi, from July to December 2009. METHODOLOGY A total of 70 patients havi...