In this work 1 , we study graphene growth dynamics on epitaxial Cu thin film substrates by chemical vapor deposition (CVD). These surfaces have a single crystallographic orientation and are atomically smooth, unlike their foil counterparts, making them better platforms on which to reproducibly synthesize highquality graphene and study crystal growth evolution. Consequently, we gained novel insi...

Thin films of SnO2 nanowires were successfully prepared by using chemical vapor deposition (CVD) process on quartz substrates. Afterwards, a thin  layer of palladium (Pd) as a catalyst was coated on top of nanowires. For the deposition of Pd, a simple and low cost technique of spray pyrolysis was employed, which caused an intensive enhancement on the sensing response of fabricated sensors...

Rules related to the safety of cosmetic products are imposed by the Council Directive 76/768/EEC (Cosmetics Directive) of 27 July 1976 (with subsequent amendments and adaptations). Article 2 states that: "A cosmetic product put on the market within the Community must not cause damage to human health when applied under normal or reasonably foreseeable conditions of use ..." Article 7 explains th...

In contrast to the traditional chemical vapor deposition technique under high vacuum, we introduce a deposition method in liquid to prepare Pt patterns on substrate near 100 °C by seed growth.

Photoluminescence Study of Gallium Arsenide, Aluminum Gallium Arsenide, and Gallium Antimonide Thin Films Grown by Metalorganic Chemical Vapor Deposition

The growth rate and uniformity of Carbon Nano Tubes (CNTs) based on Chemical Vapor Deposition (CVD) technique is investigated by using a numerical model. In this reactor, inlet gas mixture, including xylene as carbon source and mixture of argon and hydrogen as  carrier gas enters into a horizontal CVD reactor at atmospheric pressure. Based on the gas phase and surface reactions, released carbon...

GROWTH AND CHARACTERIZATION OF FERROMAGNETIC SEMICONDUKTOR GaN:Mn THIN FILMS USING PLASMA ASSISTED METALORGANIC CHEMICAL VAPOR DEPOSITION(PA-MOCVD)

Mewlude Imam, Konstantin Gaul, Andreas Stegmueller, Carina Höglund, Jens Jensen, Lars Hultman, Jens Birch, Ralf Tonner and Henrik Pedersen, Gas phase chemical vapor deposition chemistry of triethylboron probed by boron-carbon thin film deposition and quantum chemical calculations, 2015, Journal of Materials Chemistry C, (3), 41, 10898-10906. http://dx.doi.org/10.1039/c5tc02293b Copyright: Royal...

Small-angle X-ray scattering (SAXS) was performed on single-crystal chemical vapor deposition (CVD) diamonds with low nitrogen concentrations, which were fabricated by microwave plasma-assisted chemical vapor deposition at high growth rates. High optical quality undoped 500 µm-thick single-crystal CVD diamonds grown without intentional nitrogen addition proved to be excellent as windows on SAXS...

the suitability of three vapor deposition techniques for pore size modification was evaluated using polycarbonate track etched membranes as model supports. a feature scale model was employed to predict the pore geometry after modification and the resulting pure water flux. physical vapor deposition (pvd) and pulsed plasma-enhanced chemical vapor deposition (pecvd), naturally, form asymmetric na...