A Introduction Research and manufacturing related to silicon devices, circuits, and systems often relies on the wet-chemical etching of silicon wafers. The dissolution of silicon using liquid solutions is needed for deep etching and micromachining, shaping, and cleaning. Also, wet-chemistries are often used for defect delineation in single crystal silicon materials. In this paper, a review of t...

With the development in egocentric vision, skill measurement has been recently proposed as a novel topic in this emerging field. In this report, we record the the experimenter’s first-person videos in Wet labratories (wetlab), and measure his/her operative skills. Specifically, given the videos of expert and amateur, we analyze their head motions, hands motions, eye-hand coordinations and key-m...

in this work, ag-cu nanoparticles (with different percentages of copper, 10%, 25%, 50%, 75% cu) were synthesized by wet chemical method. copper(ii) sulfate and silver nitrate were taken as metal precursors, ascorbic acid as reducing agent and anhydride maleic (ma) as a modifier. the prepared nanoparticles were characterized by means of x-ray diffraction (xrd) technique and scanning electron mic...

According to the research reports from the FM (Factory Mutual) Insurance Company, for the past two decades most of the incidents that occurred in semiconductor plants were identified as “Fire Cases.” These reports claimed the fires in Wet Chemical Cleaning Processes were mainly caused by heater failure, yet, based on the process conditions, a heater is designed to shut down automatically when t...

There are basically two ways to etch silicon: dry and wet chemical etching. In micromachining, the control of the shape of the structure is accomplished by anisotropic etching through mask openings. The anisotropy of wet chemical etching is related to the crystal structure of silicon, while that of dry etching stems from the momentum of ions impinging the substrate. The latter gives us much mor...