Reactive sputtering of aluminum oxide in a planar magnetron system is conducted with a mixture of O and Ar reacting with 2 and bombarding an aluminum target. The aluminum target is powered by a pulsed directed current (DC) bias which functions to discharge the accumulated ions on the insulating AlO film surface during the positive duty cycle and suppresses arc formation. x A seven-turn helical ...

The ZnO:Al thin films were prepared by RF magnetron sputtering on Si substrate using Pt as interdigitated electrodes. The structure was characterized by XRD and SEM analyses, and the ethanol vapor gas sensing as well as electrical properties have been investigated and discussed. The gas sensing results show that the sensitivity for detecting 400 ppm ethanol vapor was ~20 at an operating tempera...

In conventional sputter etching, heterogeneous surfaces are eroded at generally unpredictable rates. The reasons for this are discussed and a solution to the problem is given: Based on control of redeposition, the technique involves the use of a device called a “catcher,” which is placed near the target of the sputtering chamber to trap re-emitted particles. Experiments are described which conf...

Measurements were carried out on radio-frequency magnetron-sputtered amorphous and microcrystalline gallium-arsenide (GaAs) films, which were fabricated under various sputtering conditions such as annealing temperature (up to 450˚C), substrate temperature (up to 200˚C), sputtering pressure (up to 20 mTorr), rf sputtering power (up to 800 W), and hydrogen partial pressure (25% H 2 in a mixture w...

We present results of a range of experiments of sputtering of water ice together with a guide to the literature. We studied how sputtering depends on the projectile energy and fluence, ice growth temperature, irradiation temperature and external electric fields. We observed luminescence from the decay of H(2p) atoms sputtered by heavy ion impact, but not bulk ice luminescence. Radiolyzed ice do...

In this paper, we present a chemiresistive metal oxide (MOX) sensor for detection of hydrogen sulfide. Compared to the previous reports, the overall sensor performance was improved in multiple characteristics, including: sensitivity, selectivity, stability, activation time, response time, recovery time, and activation temperature. The superior sensor performance was attributed to the utilizatio...

Zn depletion by energetic negative oxygen ion re-sputtering is one of the main factors influencing optoelectronic properties aluminum doped zinc oxide thin films deposited RF magnetron sputtering.