نتایج جستجو برای: plasma assisted cvd
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Boron nitride nanotubes (BNNTs), the structural analogues to carbon (CNTs), attracted considerable attention due their excellent properties. However, synthesis of BNNTs suffers from high-temperature requirement, which increases cost and adds complexity instruments (arc-discharge, plasma-assisted CVD, etc.), preventing further exploration use harmful chemicals (catalytic chemical vapor depositio...
A concentration series of Y3Al5O12:Ce solid solutions were prepared, and the composition demonstrating highest X-ray luminescence intensity cerium was identified. Based on best composition, a luminescent diamond–Y3Al5O12:Ce composite films synthesized using microwave plasma-assisted chemical vapor deposition (CVD) in methane–hydrogen gas mixtures. Variations amounts embedded powders allowed for...
LPCVD is a process used in the manufacturing of the deposition of thin films on semiconductors usually ranging from a few nanometers to many micrometers. LPCVD is used to deposit a wide range of possible film compositions with good conformal step coverage. These films include a variety of materials including polysilicon for gate contacts, thick oxides used for isolation, doped oxides for global...
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