In this study, physical vapor deposition (PVD) Ti-Cr-N coatings were deposited at two different temperatures 100 and 400ºC on hardened and tempered tool steel substrates. The influence of the applied deposition temperature on the physical and mechanical properties of coatings such as roughness, thickness, phase composition, hardness and Young’s modulus were evaluated. Phase compositions were st...

The paper summarizes the current development of high-velocity oxygen–fuel coupled physical vapor deposition (HVOF-PVD) duplex coatings as protective candidates. Following a detailed historical overview HVOF and PVD technologies, fabrication methods for are presented. coating superimposes synergistic advantages deposited by PVD, where traditional weaknesses each technique modified to great certa...

Nanocomposite SiOx particles have been produced by a single step plasma spray physical vapor deposition (PS-PVD) through rapid condensation of SiO vapors and the subsequent disproportionation reaction. Core-shell nanoparticles, in which 15 nm crystalline Si is embedded within the amorphous SiOx matrix, form under typical PS-PVD conditions, while 10 nm amorphous particles are formed when process...

Physical vapor deposition (PVD) using ionized metal plasmas (ionized PVD or IPVD) is widely used to deposit conducting diffusion barriers and liners such as Ta and TaN for use in ultra-large-scale integrated (ULSI) interconnect stacks. Ionized PVD films exhibit the low resistivity, high density, and good adhesion to underlying dielectric desired for this application. On the other hand, extendin...

Abstract Physical vapor deposition (PVD) refers to the removal of atoms from a solid or liquid by physical means, followed those on nearby surface form thin film coating. Various approaches and techniques are applied release including thermal evaporation, electron beam ion-driven sputtering, laser ablation, cathodic arc-based emission. Some based plasma discharge, while in other cases composing...

Most published research works on the development of tool life model in machining of hardened steels have been mainly concerned with the turning process, whilst the milling process has received little attention due to the complexity of the process. Thus, the aim of present study is to develope a tool life model in end milling of hardened steel AISI D2 using PVD TiAlN coated carbide cutting tool....

Engineering electronic structure of atomically thin two-dimensional (2D) materials is of great importance to their potential applications. In comparison to numerous other approaches, such as strain and chemical functionization, alloying can continuously tune the band gaps in a wide energy range. Atomically thin 2D alloys have been prepared and studied recently due to their potential use in elec...

2D Two dimensional 3D Three dimensional BEOL Back end of line BI Burn-In CMP Chemical mechanical polishing D2D Die-to-die D2W Die-to-wafer ECD Electro-chemical deposition ECG Deleted in chapter EMIB Embedded multi-die interconnect bridge FEOL Front end of line IP Intellectual property KGD Known good die KOZ Keep out zone MCM Multi chip module MCP Multi chip package MEOL Middle end of line MPM M...

Abstract Physical vapor deposition (PVD) sputtering is a promising technique for the generation of electrically conductive coatings on complex structured biomaterials, such as nonwovens, that can be used in implants. The ultra-thin fulfil variety purposes, drug depot or biosensor. aim our studies was to determine feasibility generating thin silver (Ag) poly-L-lactide (PLLA) nonwovens by and the...