Jean-Paul Vincent, Cyrille Baudouin, Jérôme Bruyere, Jean-Yves Dantan, Régis Bigot. Gear metrology of statistical tolerancing by numerical simulation. International Conference on Advanced Mathematical and Computational Tools in Metrology and Testing/ AMCTM VIII, Jun 2008, Paris, France. World Scientific Publishing, Advanced mathematical&computational tools in metrology&testing VIII, 78, pp.344-...

Plasma etch is a complex semiconductor manufacturing process in which material is removed from the surface of a silicon wafer using a gas in plasma form. As the process etch rate cannot be measured easily during or after processing, virtual metrology is employed to predict the etch rate instantly using ancillary process variables. Virtual metrology is the prediction of metrology variables using...

A novel method capable of delivering relative optical path length metrology with nanometer precision is demonstrated. Unlike conventional dualwavelength metrology which employs heterodyne detection, the method developed in this work utilizes direct detection of interference fringes of two He-Ne lasers as well as a less precise stepper motor open-loop position control system to perform its measu...

A novel cable-based metrology system is presented wherein six cables are connected in parallel from ground-mounted string pots to the moving object of interest. Cartesian pose can be determined for feedback control and other purposes by reading the lengths of the six cables via the string pots and using closed-form forward pose kinematics. This paper focuses on a sculpting metrology tool, assis...

Statistical metrology is the body of methods for understanding variation in microfabricated structures, devices, and circuits. The goal of this paper is to describe key features of statistical metrology, to review the tools and methods developed to date, and present an application of statistical metrology to advanced technology and design rule development. A running application example will be ...

As we move forward to the 45 and 32nm node, MuGFET’s (Multi-Gate Field-Effect Transistor) are considered more and more as a necessary alternative to keep pace with Moore's Law. If proven manufacturable, MuGFET’s could eventually replace conventional CMOS transistors within a few years. The ability to perform proper and extensive metrology in a production environment is then essential. We invest...

5.1.1 Vibration Detection in the Presence of a Reference Wave 5.1.2 Vibration Detection without a Reference Field 5.2 Deformation Measurement by Speckle Interferometry 5.3 In-Plane Oscillations by Image Plane Recording 5.3.1 Theory 5.3.2 Time-Average Exposures of in-Plane Oscillations 5.3.3 Display of Young's Fringes 5.3.4 Comparison of Fringe Shapes for Different Motions 5.4 Tilt Analysis by F...

To help identify the strengths of proposed software measurement methods, this paper proposes an analytical approach based on metrology concepts documented in the ISO International Vocabulary of Basic and General Terms in Metrology. This approach is illustrated with a case study using one specific functional size measurement method recognized as an ISO standard: COSMIC-FFP (ISO 19761). The case ...