Novel ultrathin TiO2–Cu nanoparticulate films sputtered by highly ionized pulsed plasma magnetron sputtering (HIPIMS) lead to faster bacterial inactivation compared to more traditional sputtering approaches with an appreciable metal saving. HIPIMS sputtering induces a strong interaction of the TiO2–Cu-ions (M ) with the polyester surface due to the high fraction and density of M-ions interactin...

copper thin films with nano-scale structure have numerous applications in modern technology.  in this work, cu thin films with different thicknesses from 50–220 nm have been deposited on glass substrate by dc magnetron sputtering technique at room temperature in pure ar gas. the sputtering time was considered in 4, 8, 12 and 16 min, respectively. the thickness effect on the structural, morpholo...

The total energy flux in a high power impulse magnetron sputtering (HiPIMS) plasma has been measured using thermal probes. Radial flux (parallel to the magnetron surface) as well as axial flux (perpendicular to the magnetron surface) were measured at different positions, and resulting energy flux profiles for the region between the magnetron and the substrate are presented. It was found that th...

The ZnO:Al thin films were prepared by RF magnetron sputtering on Si substrate using Pt as interdigitated electrodes. The structure was characterized by XRD and SEM analyses, and the ethanol vapor gas sensing as well as electrical properties have been investigated and discussed. The gas sensing results show that the sensitivity for detecting 400 ppm ethanol vapor was ~20 at an operating tempera...

Using a combinatorial approach, Cr, Al and C have been deposited onto sapphire wafer substrates by High Power Impulse Magnetron Sputtering (HiPIMS) and DC magnetron sputtering. X-ray photoelectron spectroscopy, X-ray absorption spectroscopy and X-ray diffraction were employed to determine the composition and microstructure of the coatings and confirm the presence of the Cr2AlC MAX phase within ...

We describe the magnetron sputtering deposition of thin films at oblique angles. A general relation between the deposition rate of the film and experimental parameters such as gas pressure or substrate tilt angle is deduced and experimentally tested. The model also permits the direct determination of the thermalization mean free path of the sputtered particles in the plasma gas, a key magnitude...

Amorphous carbon films are deposited employing high power impulse magnetron sputtering (HiPIMS) at pulsing frequencies of 250 Hz and 1 kHz. Films are also deposited by direct current magnetron sputtering (dcMS), for reference. In both HiPIMS and dcMS cases, unipolar pulsed negative bias voltages up to 150 V are applied to the substrate to tune the energy of the positively charged ions that bomb...

Microstructural features of sputtered chromium and chromium-50 wt. % platinum thin films on carbon substrates are presented. Films produced by rf sputtering and dc magnetron sputtering are compared using analytical electron microscopy techniques. All rf-sputtered films are uniform in chemistry and thickness and are amorphous. The chromium film became crystalline with a grain size ofless than 10...

very smooth thin films of iridium have been deposited on super polished fused silica (sio2) substrates using dc magnetron sputtering in argon plasma. the influence of deposition process parameters on film micro roughness has been investigated. in addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

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