The method of TiSiCN-coatings deposition by anodic evaporation Ti and decomposition an organosilicon precursor (hexamethyldisilazane) in a low-pressure (∼1 mTorr) nitrogen-argon arc discharge with self-heated hollow cathode is investigated. plasma composition was analyzed optical emission spectroscopy. TiSiCN coatings thickness up to 10 microns hardness 30 GPa were obtained 1.5 hours at tempera...

MCM-48 was surface modified via vapor-phase reactions with hexamethyldisilazane (CH(3)-MCM-48) and 3-aminopropyldimethylethoxysilane (NH(2)-MCM-48). (29)Si NMR confirmed that the resulting materials contained covalently attached trimethylsilane and 3-aminopropyldimethylsilane moieties, both important functionalities for bioseparation applications. The surface coverage was approximately 1.8 and ...

Trimethylsilylation of a variety of alcohols and phenols, in the presence of silica chloride, using hexamethyldisilazane (HMDS) in solution and under solvent-free conditions is reported. Trimethylsilyl ethers were formed in excellent yields both for aliphatic alcohols and phenols without having an electron-withdrawing group. In addition, SiO2-Cl can be recovered and reused after drying.

trimethylsilylation of a variety of alcohols and phenols, in the presence of silica chloride, using hexamethyldisilazane (hmds) in solution and under solvent-free conditions is reported. trimethylsilyl ethers were formed in excellent yields both for aliphatic alcohols and phenols without having an electron-withdrawing group. in addition, sio2-cl can be recovered and reused after drying.

The presented study compares the structure of hexamethyldisiloxane (HMDSO) and hexamethyldisilazane (HMDSN) plasma polymer thin films with a thickness about 30 nm before after oxidation process, focusing on analysis porosity correlated electrolyte up-take in formed films. results illustrate that treatment converts HMDSO HMDSN progressively into SiOx-like However, underlying mechanism etching Cx...