نتایج جستجو برای: electron beam evaporation

تعداد نتایج: 420104  

The effect of evaporation rate on structural, morphological and optical properties of electron beam evaporated CdS thin films have been investigated. CdS thin film deposited by electron beam evaporation method in 12nm/min and 60nm/min evaporation rates on glass substrates. X-ray diffraction, scanning electron microscopy, UV-Vis-NIR spectroscopy and Atomic Force Microscopy were used to character...

2002
A. Veronig B. Vršnak B. R. Dennis M. Temmer A. Hanslmeier J. Magdalenić

Based on simultaneous observations of solar flares in hard and soft X-rays we studied several aspects of the Neupert effect. About half of 1114 analyzed events show a timing behavior consistent with the Neupert effect. For these events, a high correlation between the soft X-ray peak flux and the hard X-ray fluence is obtained, being indicative of electron-beam-driven evaporation. However, for a...

2002
A. Veronig B. Vršnak B. R. Dennis M. Temmer A. Hanslmeier J. Magdalenić

Based on a sample of 1114 flares observed simultaneously in hard X-rays (HXR) by the BATSE instrument and in soft X-rays (SXR) by GOES, we studied several aspects of the Neupert effect and its interpretation in the frame of the electron-beam-driven evaporation model. In particular, we investigated the time differences (∆t) between the maximum of the SXR emission and the end of the HXR emission,...

2003
Shan Wang J. Z. Sun D. J. Monsma D. W. Abraham

A two terminal spin-injection device is fabricated using a nanostencil process with a Co–Cu–Co stack. The stack can be deposited both by sputtering and by electron-beam evaporation. A better edge definition is observed in evaporation-deposited films under cross section transmission electron microscopy. Both methods succeeded in producing junctions with sub-100 nm lateral dimensions and show spi...

Journal: :ElectroComponent Science and Technology 1984

2010
K. D. Schierbaum M. Cherradi M. Bouchtaoui

A LabVIEW 2009-based remote and process control program for an ultra-high vacuum system and a variety of surface science experiments is presented. The apparatus consists of five individual recipients for sample preparation, surface analysis, scanning tunneling microscopy and a central chamber connecting them by means of gate-valves. All processes like electron-beam heating, ion sputtering, gas ...

Journal: :Applied optics 2011
James B Oliver Pete Kupinski Amy L Rigatti Ansgar W Schmid John C Lambropoulos Semyon Papernov Alexei Kozlov John Spaulding Daniel Sadowski Z Roman Chrzan Robert D Hand Desmond R Gibson Ian Brinkley Frank Placido

Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density, and stresses of thin films. A dual-source plasma system provides stress control of large-aperture, high-fluence coatings used in vacuum for substrates 1m in aperture.

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