Ti1-xAlxN coated tools are commonly used in high-speed machining, where the cutting edge of an end-mill or insert is exposed to temperatures up to 1100 °C. Here, we investigate the effect of Yttrium addition on the thermal stability of Ti1-xAlxN coatings. Reactive DC magnetron sputtering of powder metallurgically prepared Ti0.50Al0.50, Ti0.49Al0.49Y0.02, and Ti0.46Al0.46Y0.08 targets result in ...

copper thin films with nano-scale structure have numerous applications in modern technology.  in this work, cu thin films with different thicknesses from 50–220 nm have been deposited on glass substrate by dc magnetron sputtering technique at room temperature in pure ar gas. the sputtering time was considered in 4, 8, 12 and 16 min, respectively. the thickness effect on the structural, morpholo...

Anatase TiO2 thin films were deposited in a d.c. reactive magnetron sputtering system. It was found that there is a strong dependence between anatase-rutil structures of TiO2 films and the technological conditions, the most relevant parameter being the oxygen percentage from the argon and oxygen mixture. Our measurements carried out for electrical properties of d.c. magnetron sputtering TiO2 th...

Very smooth thin films of iridium have been deposited on super polished fused silica (SiO2) substrates using dc magnetron sputtering in argon plasma. The influence of deposition process parameters on film micro roughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

The use of pulsed dc-sputtering sources for reactive magnetron sputtering with oxygen offers a possibility to suppress the negative effects target poisoning (such as arcing). This results in wide process range selection desired operating point. control plays major role maintaining constant coating properties and affects stoichiometry coating, well rate economic impact process. In hysteresis, du...

Using a combinatorial approach, Cr, Al and C have been deposited onto sapphire wafer substrates by High Power Impulse Magnetron Sputtering (HiPIMS) and DC magnetron sputtering. X-ray photoelectron spectroscopy, X-ray absorption spectroscopy and X-ray diffraction were employed to determine the composition and microstructure of the coatings and confirm the presence of the Cr2AlC MAX phase within ...

Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of a source material, the target. Ion bombardment results in a vapor due to a purely physical process, i.e. the sputtering of the target material. Hence, this technique is part of the class of physical vapor deposition techniques, which includes, for example, thermal ev...