using c2h2, 112 and as gases at 550'c, carbon nanotubes were fabricated on the surfaces of twosubstrates coated by nano thin layers of metal catalysts by dc magnetron sputtering. aystamless steel andfe/cteal, by thermal chemical vapor deposition (tcvd) the surface properties of the substrates wereparticularly investigated, and the effect of treatment of the substrates on the cnt's growth is cri...

the current study reports some interesting growth of novel in2o3 nanostructures using ambient-controlled chemical vapor deposition technique in the presence of a strongly reducing hydrazine ambient. the experiments are systematically carried out by keeping either of the carrier gas flow rate or the source temperature constant, and varying the other. for each of the depositions, the growth is st...

Chemical vapour deposition (CVD) is a powerful technology for producing high-quality solid thin films and coatings. Although widely used in modern industries, it continuously being developed as adapted to new materials. Today, CVD synthesis pushed heights with the precise manufacturing of both inorganic 2D materials high-purity polymeric that can be conformally deposited on various substrates. ...

Two-stage chemical deposition (TSCD) technique is used to produce ZnO, Mn2O3 and NiO films on soda-lime glass (SL-G) from an aqueous solution of zinc, manganese and nickel complex, respectively. The TSCD method enables the deposition of metal oxide thin films with a thickness which can be controlled during the preparation procedure. The ZnO, Mn2O3 and NiO thin films were polycrystalline films w...

In this work optical properties of SiOX ð0 , X , 2Þ layers obtained by plasma enhanced chemical vapor deposition are studied. Infrared spectra and refractive index dependences with the reactant gases flow ratio R are explained for as deposited, aged and thermally treated samples in the R range from 9.17 to 110. Variations are found to be influenced mainly by sample stoichiometry, density and Si...