In this paper a two-step glass wet-etching process is presented. This process allows the fabrication of well-defined shallow recesses (typically 1-40μm) together with deep trenches or waferthrough holes (100-500μm) in the same glass wafer. The etching solutions and the masking materials used are described for the three glass types frequently used in sensor fabrication. This process is developed...

The defect structure in relaxed (100) InGaAs/GaAs heteroepitaxial systems grown by molecular beam epitaxy is studied by selective electrochemical (anodic) etching. By incremental layer removal, we map the depth profile of the dislocation density. The density of dislocations is inversely proportional to the layer thickness and increases with misfit. The results are compared to theoretical models.

Potential application of the high aspect ratio cryogenic SF6/O2 plasma ething process for developing trench based inertial micromechanical devices with capacitive sensing, is investigated and demonstrated. An ICtechnology compatible process flow involving anodic bonding of silicon to glass and plasma etching as a single post processing step is identified. It involves a novel method for front-to...

Cu electrodeposition was performed on a cylindrical AZ80 substrate with a U-shaped surface. A uniform deposition of Cu was achieved on an AZ80 electrode via galvanostatic etching, followed by Cu electrodeposition in an eco-friendly alkaline Cu plating bath. Improper wetting and lower rotational speeds of the AZ80 electrode resulted in an uneven Cu deposition at the inner upper site of the U-sha...

This paper presents a new research study on the platform fabrication of fluorescence bio-detection chip with an optical fiber transmission. Anisotropic wet etching on (100) silicon wafers to fabrication V-groove for optical fiber alignment and micro-mirror were included. Combing with anodic bonding technique to adhere glass, silicon structure and optical fiber for a fluorescence excitation plat...

Porous alumina films formed by aluminum anodic oxidation have been intensively studied to use them as molds to form nanowires or dots. Recently we established the formation of porous alumina on solid substrates such as Si, and found a formation of an ordered aluminum hexagonal dot array after finishing of anodic oxidation on a SiO2 substrate. We investigated AFM nanoindentation to control the i...

Novel anodic aluminium oxide (AAO) films and hollow nanostructures were synthesized via a simple electrochemical and chemical etching route; fluctuating nanotube growth inside AAO film fabricated under ultra-high voltage was considered to be the main reason for the formation of such new structures.

Wet-chemical etching of the barrier oxide layer of anodic aluminum oxide (AAO) was systematically investigated by using scanning electron microscopy (SEM), secondary ion mass spectrometry (SIMS), and a newly devised experimental setup that allows accurate in situ determination of the pore opening point during chemical etching of the barrier oxide layer. We found that opening of the barrier oxid...