نتایج جستجو برای: روش نهشت glad glancing angle deposition نانو ذرات si مقاومت سطحی تخلخل
تعداد نتایج: 692093 فیلتر نتایج به سال:
In this work, the elasticity constants of anisotropic thin films were determined using a model developed specifically in order to use Impulse Excitation Technique (IET). The is based on lamination theory and was validated with finite element analysis. IET used flexural torsional vibration modes determine Young's shear moduli coatings. behavior evaluated for titanium deposited by magnetron sputt...
Minimization of helices opens a door to impose novel functions derived from the dimensional shrinkage of optical, mechanical and electronic devices. Glancing angle deposition (GLAD) enables one to deposit three-dimensional helical porous thin films (HPTFs) composed of separated spiral micro/nano-columns. GLAD integrates a series of advantageous features, including one-step deposition, wafer-sca...
We report on the evolution of anisotropic electrical resistivity versus temperature of titanium thin films. An oriented titanium film (1 μm thick) is sputter deposited by GLancing Angle Deposition (GLAD) using an incident angle α = 80° of the particle flux. Two parallel Ti electrodes cover this GLAD film. We measure the components of the conductivity tensor by the van der Pauw method during an ...
The rutile TiO2 films with columnar nanostructure were prepared by combining the glancing angle deposition (GLAD) technique in magnetron sputtering system with the subsequent two-step annealing treatment. Experimental results showed that all the TiO2 films kept discrete columnar structures as the Ti films deposited by GLAD and accomplished the phase transition from Ti to rutile TiO2. Such TiO2 ...
We report on thermal conductivity of W films 350 nm thick sputter-deposited by glancing angle deposition (GLAD). The 3? method is used to measure the in-plane kx and ky for deposited with a ? 0° 80°. For classical (?=0°), 71 m?1 K?1, whereas GLAD (?=80°) conduction drops kx=3.2 K?1 ky=4.8 K?1. anisotropy corresponds heat favored in direction perpendicular axis, which related anisotropic columna...
We report the fabrication and optical characterization of a tetragonal square spiral photonic crystal with a three-dimensional relative band gap of approximately 10% using the glancing angle deposition (GLAD) technique. This thin film structure is produced in a one-step process that is highly versatile as a wide range of crystal structures can be created simply through the variation of depositi...
In order to obtain a better photocatalytic performance under visible light, Ag2S-coupled TiO2 nanorod arrays (NRAs) were prepared through the electron beam deposition with glancing angle deposition (GLAD) technique, annealing in air, followed by the successive ionic layer absorption and reaction (SILAR) method. The properties of the photoelectrochemical and photocatalytic degradation of methyl ...
The elastic response, including the spring constant, of individual Si helical-shape submicron springs, was measured using a tip-cantilever assembly attached to a conventional atomic force microscope. The isolated, four-turn Si springs were fabricated using oblique angle deposition with substrate rotation, also known as the glancing angle deposition, on a templated Si substrate. The response of ...
Periodic arrays of 160to 500-nm-wide Si and Cr nanostructures were grown on patterned Si(001) substrates by Glancing Angle Deposition (GLAD). Initial patterning was achieved by colloidal self-assembly of 500-nm-diameter polystyrene and 160-nm-diameter silica microspheres which form, during drying from suspension, close-packed hexagonal arrays. Si deposition onto a monolayer of 500-nmdiameter sp...
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