We have shown that the removal rate of blanket oxide layers does not follow Preston’s law strictly. There exist two polishing regimes which are distinguished by the magnitude of the pressure and relative velocity product, pv. For large pv typically used for polishing, a constant term should be added to the Preston term for better fit to experimental data. The modified Preston’s equation has bee...

We present an overview of the engineering design and empirical performance of four stressed-lap polishing tools developed at the University of Arizona. Descriptions of the electromechanical actuators, servo systems, computer interfacing, and attachment of the lap to the polishing machine are provided. The empirical performance of a representative tool is discussed in terms of accuracy, repeatab...

In this article, the authors report experimental results of the chemical mechanical polishing CMP of silicon dioxide SiO2 and polysilicon to produce nanoscale features with very smooth surfaces. The sizes of the features polished ranged from 30 to 500 nm. For polysilicon polishing, the nanostructures were defined in positive tone e-beam resist and the pattern was transferred to the oxide substr...

Influence of polishing methods on water sorption and solubility of denture base acrylic resins was studied. Eighty samples were divided into groups: Classico (CL), and QC 20 (QC) - hot water bath cured; Acron MC (AC), and Onda Cryl (ON) - microwave cured; and submitted to mechanical polishing (MP) - pumice slurry, chalk powder, soft brush and felt cone in a bench vise; or chemical polishing (CP...

The demonstration that Nanocrystalline Diamond (NCD) can retain the superior Young’s modulus (1100 GPa) of single crystal diamond twinned with its ability to be grown at low temperatures (<450 C) has driven a revival into the growth and applications of NCD thin films. However, owing to the competitive growth of crystals the resulting film has a roughness that evolves with film thickness, preven...

Aims: The objective of this literature review was to assess the new powders used in air polishing (AP) for subgingival debridement in terms of their debridement efficiency, effects on oral hard and soft tissues, and adverse effects. Also, to determine the disadvantages of this technique together with other relevant clinical considerations regarding its use. Methods: A literature search of five ...

A new contact-mechanics-based model for chemical–mechanical polishing is presented. According to this model, the local polish rate is controlled by the pressure distribution between features on the wafer and the polishing pad. The model uses an analysis based on the work by Greenwood to evaluate this pressure distribution taking into account pad compliance and roughness. Using the model, the e2...

The aim of this study was to evaluate the Shore A hardness and color stability of two soft lining materials after thermocycling and when chemical polishing was used or omitted. Two acrylic-based soft lining materials were tested: Coe-Soft and Soft Confort, 14 specimens were made for each material. They were distributed in four groups according to the treatment performed. The specimens were ther...

The surface roughness and material removal is investigated in electrorheological (ER) fluid-assisted polishing of tungsten carbide die. In this study, the microstructure of fibrous columns formed by particles perpendicular to the electrodes is observed by CCD when the electrical field is applied. The distribution of the electric field strength on the surface of workpiece was analyzed by ANSYS a...

The Chemical Mechanical Polishing (CMP) process is now widely employed in the manufacture of Ultra-Large-Scale Integrated (ULSI) circuits. Yet, the effects of various process parameters on the material removal rate (MRR) and the resulting surface topography are not well understood. In this chapter, accordingly, several polishing models are reviewed with emphasis on the mechanical aspects of CMP...