In speckle-based metrology systems, a finite range of possible motion or deformation can be measured. When coherent imaging systems with a single limiting aperture are used in speckle metrology, the observed decorrelation effects that ultimately define this range are described by the well-known Yamaguchi correlation factor. We extend this result to all coherent quadratic phase paraxial optical ...

A novel free release measurement facility (FRMF) was developed within the joint research project "Metrology for Radioactive Waste Management" of the European Metrology Research Programme. Before and during FRMF design and construction, Monte Carlo calculations with MCNPX and PENELOPE codes were used to optimize the thickness of the shielding, the dimensions of the container, and the shape of de...

AC-waveform synthesis with quantum-mechanical accuracy has been attracting many researchers, especially metrologists in national metrology institutes, not only for its scientific interest but its potential benefit to industries. We describe the current status at National Metrology Institute of Japan of development of a Josephson arbitrary waveform synthesizer based on programmable and pulse-dri...

Since lidars are becoming industrial instruments, it is mandatory to ensure a good traceability of parameters and performances for all users. For most Doppler lidar applications, an accurate metrology is required, first of course for the radial wind component, but also for range and line of sight direction. In order to give to the user the more reliable information about its products, Leosphere...

The marriage of optical sensing techniques with sophisticated digital signal processing has resulted in a myriad of practical metrology systems. Optical metrology systems offer many attractive measurement features. These systems are inherently non-contacting, nondestructive, and immune from electromagnetic interference. In addition, since light is used as the sensing probe, the measurement syst...

We have used coherent X-ray diffraction experiments to characterize both the 1-D and 2-D foci produced by nanofocusing Kirkpatrick-Baez (K-B) mirrors, and we find agreement. Algorithms related to ptychography were used to obtain a 3-D reconstruction of a focused hard X-ray beam waist, using data measured when the mirrors were not optimally aligned. Considerable astigmatism was evident in the re...

Estimation of physical parameters is essential in almost any part of science and technology. The enhancement of performance in this task (e.g. beating the standard classical shot-noise limit) using available physical resources is a major goal in metrology. Quantum metrology in closed systems has indicated that entanglement in such systems may be a useful resource. However, whether in open quant...

The semiconductor industry uses lithography machines for manufacturing complex integrated circuits (also called ICs) onto wafers. Because an IC is built up layer by layer it is very important to align the wafer each time it enters the machine. Today, gratings are used for this alignment step. Gratings are tiny periodic structures printed on a wafer and are even smaller than ICs. These gratings ...

Is it a defect? Will it print? Accelerating shrinks depends on successful pattern transfer. 8 Precision and Process Control Maintaining an acceptable precision-to-tolerance ratio drives adoption of a new metrology technique for sub-0.18 µm linewidth control. Investigating and quantifying overlay accuracy is only as good as the data you have. 35 Exposing The SCAAM Eliminate anomalies that afflic...

A lightweight and electrically passive interferometer is demanded by a number of applications for precision metrology such as machine tool metrology and on-machine feedback [1]. To satisfy these requirements, a fiber-optic coupled heterodyne displacement measuring Michelson interferometer (FIDMI) shown in Fig.1 has been developed in the Center of Precision Metrology (CPM) at the University of N...