due to the scarcity of water resources, the need for sustainable development of drip irrigation tape is essential in iran. a number of drip irrigation tape systems used in sugar beet fields of isfahan and chahar mahal va bakhtiari provinces were evaluated and were compared with furrow irrigation methods in two consecutive years. the actual water use efficiency (wuesy, wuewsy) in lower quarter, ...

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It can be proved that 1/N ≤ DN ≤ 1 and 1/(2N) ≤ D∗ N ≤ DN ≤ 2D∗ N . The sequence X is uniformly distributed in [0, 1) if and only if limN→∞DN(X) = 0. We are interested in low-discrepancy sequences, that is, sequences X for which DN(X) is small for all N . The efficient construction of such X is essential in quasi-Monte Carlo algorithms used, for example, to approximate a multivariate integral o...

b. Nominative object: AGR P AGR ' s s 6 5 5 5 5 Spec AGR V NP PP s There 3PL are people at the door < LF movement c. Accusative object: AGR P AGR P AGR ' s o o 6 5 5 5 5 5 Spec Spec AGR V NP o John reads a book < LF movement In (1a), the "functional" head AGR enters into a double agreement relation s(ubject) with its specifier: the 0-features of the specifier are copied onto the head, and a Cas...

Sir, ‘References’ in an article includes the list of articles, books or the communications that have been referred to/consulted in presenting the document. They provide the source of the information being quoted in the article. The International Committee of Medical Journal Editors (ICMJE) has created the Uniform Requirements, primarily to help authors and editors in their mutual task of creati...

In order to study circuit complexity classes within NC in a uniform setting we need a uniformity condition which is more restrictive than those in common use Two such conditions stricter than NC uniformity Ru Co have appeared in recent research Immerman s families of circuits de ned by rst order formulas Im a Im b and a unifor mity corresponding to Buss deterministic log time reductions Bu We s...

A quantitative model capturing pattern density effects in Deep Reactive Ion Etch (DRIE), which are important in MEMS, is presented. Our previous work has explored the causes of wafer-level variation and demonstrated die-to-die interactions resulting from pattern density and reactant species consumption. Several reports have focused on experimental evidence and modeling of feature level (aspect ...