Wim Bogaerts, Vincent Wiaux*, Dirk Taillaert, Stephan Beckx*, Roel Baets Ghent University-IMEC, Dept. of Information Technology, Sint-Pietersnieuwstraat 41, 9000 Gent, Belgium * IMEC vzw, Silicon Process Technology Division, Kapeldreef 75, B-3001 Leuven, Belgium Tel: (32) 9 264 3446, Fax: (32) 9264 3593 , e-mail: [email protected] ABSTRACT We demonstrate the use of deep UV lithograph...

Nucleotide arrays require controlled surface densities and minimal nucleotide-substrate interactions to enable highly specific and efficient recognition by corresponding targets. We investigated chemical lift-off lithography with hydroxyl- and oligo(ethylene glycol)-terminated alkanethiol self-assembled monolayers as a means to produce substrates optimized for tethered DNA insertion into post-l...

Flow lithography has become a powerful particle synthesis technique. Currently, flow lithography relies on the use of polydimethylsiloxane microchannels, because the process requires local inhibition of polymerization, near channel interfaces, via oxygen permeation. The dependence on polydimethylsiloxane devices greatly limits the range of precursor materials that can be processed in flow litho...

Nanoimprint lithography, a high-throughput, low-cost, nonconventional lithographic method proposed and demonstrated recently, has been developed and investigated. Nanoimprint lithography has demonstrated 10 nm feature size, 40 nm pitch, vertical and smooth sidewalls, and nearly 90 ° corners. Further experimental study indicates that the ultimate resolution of nanoimprint lithography could be su...

Particle lithography offers generic capabilities for the high-throughput fabrication of nanopatterns from organosilane self-assembled monolayers, which offers the opportunity to study surface-based chemical reactions at the molecular level. Nanopatterns of octadecyltrichlorosilane (OTS) were prepared on surfaces of Si(111) using designed protocols of particle lithography combined with either va...

We report a surface energy-controlled low-pressure chemical vapor deposition growth of WS2 monolayers on SiO2 using pre-growth oxygen plasma treatment of substrates, facilitating increased monolayer surface coverage and patterned growth without lithography. Oxygen plasma treatment of the substrate caused an increase in the average domain size of WS2 monolayers by 78% ± 2% while having a slight ...

This article describes an accurate subPico flowmeter bifurcatedin to liquid and gas flowrates less than 1mol/s for both MEMS/NEMS and cryogenic technology applications. The MEMS/NEMS are described as either two Gauges (instrument), or quartz fluctuating forks, even if the liquid or gas flows through an element, as well as cryogenic technology consisting of arrays of e...

A technique for synthesizing nanostructures by current lithography in a scanning tunneling microscope (STM lithography) layered Au/Si structures has been developed. An experimental dependence of the geometric dimensions created on time STM obtained. theoretical model growth is proposed, which explains nonlinear radius obtained with saturation region large radii. Keywords: nanostructures, lithog...

The design, fabrication, and measurement of planar, passive Bragg grating-based transmission filters is presented. We combine interferometric lithography, spatial-phase-locked electron-beam lithography, x-ray nanolithography, and optical lithography with silica-on-silicon waveguiding substrates to define rib waveguides and grating patterns that have multiple quarter-wave shifts along the gratin...