It is well established that the bulk etch rates for solid state nuclear track detectors are a ected by the concentration and the temperature of the etchant. Recently, we found that the bulk etch rate for the LR 115 detector to be a ected by stirring during etching. In the present work, the e ects of stirring on the bulk etch rate of the CR-39 detector is investigated. One set of sample was etch...

The SEMATECH sponsored J-88-E project teaming Texas Instruments with NeuroDyne (et al) focused on Fault Detection and Classification (FDC) on a Lam 9600 aluminum plasma etch reactor, used in the process of semiconductor fabrication. Fault classification was accomplished by implementing a series of virtual sensor models which used data from real sensors (Lam Station sensors, Optical Emission Spe...

OBJECTIVES The aim of this study was to evaluate the (1) bond strength of a etch-and-rinse and self-etching adhesive systems to cavosurface enamel, (2) influence of the previous acid etching with phosphoric acid 35% to the self-etching adhesive application on bond strength values, and (3) analysis of the cavosurface enamel morphology submitted to different types of conditioning, with the use of...

in this paper, we have studied the electrical properties of the randomly distributed metallic (co and fe) nano/ micro wires on silicon substrate. deposition was carried out potentiostatically into the pores of the track-etch polycarbonate membrane spin coated onto the si substrate. spin coated films were irradiated with 150mev ni (+11) ions at a fluence of 8e7 ions/cm2, followed by uv irradiati...

To control deposition profile of carbon films in trenches, we have studied substrate temperature and aspect ratio dependence of deposition rate of carbon films, deposited by CVD plasma of toluene diluted H2, in trenches. The deposition rates increases with decreasing the aspect ratio, because the incident radical flux per surface area in a trench increases with decreasing the aspect ratio. The ...

The ability of 8 picosecond pulse lasers for three dimensional direct-writing in the bulk of transparent dielectrics is assessed through a comparative study with a femtosecond laser delivering 600 fs pulses. The comparison addresses two main applications: the fabrication of birefringent optical elements and two-step machining by laser exposure and post-processing by chemical etching. Formation ...

PURPOSE The aim of this study was to compare the surface roughness of zirconia when using Zircos E etching system (ZSAT), applying a nitric acid-hydrofluoric acid compound as a pretreatment agent, and also to compare the shear bonding strength according to different resin cements. MATERIALS AND METHODS ZSAT, air abrasion, and tribochemical silicacoating were applied on prepared 120 zirconia s...

LR 115 is a solid-state nuclear track detector (SSNTD) based on cellulose nitrate and has been commonly used for measurements of concentrations of radon gas and/or radon progeny. These measurements depend critically on the removed thickness of the active layer during etching. However, the thickness of removed layer calculated using the etching period does not necessarily provide a su6ciently ac...

AIMS These were to firstly evaluate the shear bond strength of a composite resin to primary dental enamel treated with a standard adhesive system but with varying phosphoric acid etching times along with a self-etching prime, secondly to analyse the etching patterns using SEM. METHODS Forty primary molars were used. In the first three groups, following acid etching, a layer of Prime & Bond NT...