In this paper we describe the tunneling junction model effect on silicon nanowire gate-allaround field effect transistor using CMOS 45 nm technology. Tunneling effects provides better subthreshold slope, excellent drain induced barrier lowering and superior ION-IOFF ratio.This paper demonstrates the gate controlled tunneling at source of Gate-all-around field effect transistor. Low leakage curr...

Three-Independent-Gate Field-Effect Transistors (TIGFETs) are a promising alternative technology that aims to replace or complement CMOS at advanced nodes. In this paper, we extracted the parasitic and intrinsic capacitances of silicon-nanowire TIGFET device using three-dimensional numerical simulations in an attempt accurately compare its and, consequently, circuit-level performances comparabl...

In this article, a new structure is presented for MOS (Metal Oxide Semiconductor)-like junctionless carbon nanotube field effect transistor (MOS-like J-CNTFET), in which dual material gate with different work-functions are used. In the aforementioned structure, the size of the gates near the source and the drain are 14 and 6 nm, respectively, and the work-functions are equal and 0.5 eV less tha...

1) Introduction Recent systems are built of MOSFET transistors. Here, MO stands for metal oxide and FE for field effect. This means, that – in contrast to bipolar transistors – the gate is isolated by a metal oxide (today SiO2) and the channel is just controlled by the field through this oxide. Thus theoretically, the principal of MOSFET devices is that there is no current flowing through the g...

In this paper, we propose a novel design analysis for a Junctionless Double Gate Vertical MOSFET (JLVMOS) with metal gate electrode and HfO2, for which the simulations have been performed using TCAD (ATLAS), The simulated results exhibits significant improvements in comparison to conventional JLVMOS device with a polysilicon gate electrode and ITRS values for different node technology . In plac...