Abstract A multistep deposition technique is developed to produce highly oriented diamond films by hot filament chemical vapor (HFCVD) on Si (111) substrates. The orientation produced use of a thin, 5–20 nm, Ni interlayer. Annealing studies demonstrate diffusion into form nickel silicides with crystal structure depending temperature. HFCVD film interlayer results in reduced non-diamond carbon, ...
