We report on the measurement of the fringe-to-substrate phase error in our Nanoruler system. This system utilizes scanning beam interference lithography to pattern and measure large-area, nanometer-accuracy gratings that are appropriate for semiconductor and integrated opto-electronic metrology. We present the Nanonruler’s metrology system that is based on digital frequency synthesizers, acoust...

Modeling and Selection for Real-time Wafer-to-Wafer Fault Detection Applications by Jae Yeon Baek Doctor of Philosophy in Engineering – Electrical Engineering and Computer Sciences University of California, Berkeley Professor Costas J. Spanos, Chair The semiconductor manufacturing industry currently faces many challenges in terms of metrology and process control. With the delay of EUV and the a...

Michael J. Connelly, MEMBER SPIE University of Limerick Optical Communications Research Group Limerick, Ireland Abstract. Full-field optical coherence tomography OCT using a complementary metal-oxide semiconductor CMOS camera with an integrated a digital signal processor DSP is demonstrated. The CMOSDSP camera employed is typically used in machine vision applications and is based on an array of...

A new kind of parallel mechanism machine called the CGT (Cartesian-Guided Tripod) for three-axis machining, CGP (Cartesian-Guided Pentapod) for five-axis machining, and CGH (Cartesian-Guided Hexapod) for six-axis positioning is presented on this paper. The CGT/CGP/CGH has two kinds of functional independent legs: the driving functional leg and the integrated Cartesian guiding/metrology function...

In contrast to the widely used mean-line based evaluation techniques, the capabilities of morphological methods are not fully recognized in practice. Morphological operations, e.g. dilation, erosion, closing and opening, are useful tools in surface metrology and dimensional metrology. This paper presents a variety of novel applications of morphological operations in association with several of ...

147 The Evaluation of Expanded Uncertainty of Measurement Results in Direct Measurements Using the LabVIEW Environment P. Otomański, A. Szlachta Institute of Electrical Engineering and Electronics, Division of Metrology and Optoelectronics, Poznan University of Technology, Piotrowo street 3a, 60 – 965 Poznan, Poland, e-mail: [email protected] Department of Metrology and Measurement System...

In speckle-based metrology systems, a finite range of possible motion or deformation can be measured. When coherent imaging systems with a single limiting aperture are used in speckle metrology, the observed decorrelation effects that ultimately define this range are described by the well-known Yamaguchi correlation factor. We extend this result to all coherent quadratic phase paraxial optical ...

A novel free release measurement facility (FRMF) was developed within the joint research project "Metrology for Radioactive Waste Management" of the European Metrology Research Programme. Before and during FRMF design and construction, Monte Carlo calculations with MCNPX and PENELOPE codes were used to optimize the thickness of the shielding, the dimensions of the container, and the shape of de...

AC-waveform synthesis with quantum-mechanical accuracy has been attracting many researchers, especially metrologists in national metrology institutes, not only for its scientific interest but its potential benefit to industries. We describe the current status at National Metrology Institute of Japan of development of a Josephson arbitrary waveform synthesizer based on programmable and pulse-dri...

Since lidars are becoming industrial instruments, it is mandatory to ensure a good traceability of parameters and performances for all users. For most Doppler lidar applications, an accurate metrology is required, first of course for the radial wind component, but also for range and line of sight direction. In order to give to the user the more reliable information about its products, Leosphere...