نتایج جستجو برای: thin films
تعداد نتایج: 180922 فیلتر نتایج به سال:
I Abstract The present thesis focuses on carbon-based thin films prepared by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS). Carbon nitride (CN x : 0 < x < 0.20) as well as carbon fluoride (CF x : 0.04 < x < 0.35) thin films were synthesized in an industrial deposition chamber by reactive magnetron sputtering of graphite in Ne/N 2 , Ar/N 2 , Kr/N...
as we know sol-gel is one of the most important techniques for thin film preparation. in this paper, high transmission silica thin films have been prepared by dip-coating process from a new silicon-alkoxide solution. the prepared sol was stable for 45 days which is very important to characterize the coating process. the optical properties as a function of aging time, withdrawal rate, and heat t...
Solution processed metal oxide thin films are important for modern optoelectronic devices ranging from thin film transistors to photovoltaics and for functional optical coatings. Solution processed techniques such as dip-coating, allow thin films to be rapidly deposited over a large range of surfaces including curved, flexible or plastic substrates without extensive processing of comparative va...
In situ studies have been performed on thin films in the Al rich region of the Al–Cu–Fe–Cr quasicrystalline phase field. Thin films were grown by magnetron sputtering on atomically flat MgO (0 0 1) and Al O (0 0 0 1) and subsequently studied by 2 3 transmission electron microscopy and X-ray photoelectron spectroscopy. High resolution electron microscopy shows that thin films (-30 nm) grown at r...
The thermal stability and dewetting effects of crystalline organic thin films on inorganic substrates have been investigated for a model system for organic epitaxy, 3,4,9,10-perylenetetracarboxylic dianhydride ~PTCDA! on Ag~111!. The thin films deposited under a variety of growth conditions have been annealed stepwise and studied by in situ x-ray diffraction and noncontact atomic force microsco...
In this study, indium-tin-oxide thin films in different thickness ranges were prepared by electron beam evaporation method on the glass substrate at room temperature. The thicknesses of films were 100, 150 and 250nm. Using fractal analysis, morphological characteristics of surface films thickness in amorphous state were investigated. The results showed that by increasing thickness, surface rou...
The basic requirements of the CdS thin films on their applications are high optical transparency, low electrical resistivity, and better crystalinity (e.g.high orientation). Firstly, we prepared CdS films by thermal eveporation techniques on glass substrate and then studied their photoconductivity from room temperature to 200 . Secondly, we prepared CdS films with impurities of Cu, Ag, Au and...
Very thin CoCr films deposited on different underlayers on glass disk substrates were studied by the magneto-optic Kerr effect, VSM, torque magnetometcy and TEM selected area diffraction. Square or near square perpendicular loops were obtained from Co/Ti , CoCr/Au: CoCr/AI, CoCr/C and CoCr/Si films. TEM SAD study revealed that the crystalline structure is a key factor determining the magnetic a...
Optical properties, which determine the application of optical devices in different fields, are the most significant properties of optical thin films. In recent years, Metal-organic framework (MOF)-based optical thin films have attracted increasing attention because of their novel optical properties and important potential applications in optical and photoelectric devices, especially optical th...
A novel surface micromachining process is reported for aluminum nitride (AlN) thin films to fabricate piezoelectric unimorph suspension devices for micro actuator applications. Wet anisotropic etching of AlN thin film is used with a Cr metal mask layer in the microfabrication process. Tetra methyl ammonium hydroxide (TMAH) of 25 wt.% solution is used as an etching solution for the AlN thin film...
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