In this paper we describe different techniques of rendering stereo scenes in real-time. We discuss the physical properties of the given stereo setup and revise some basics knowledge needed for generating the stereo pairs. After that we discuss several techniques for rendering stereo pairs according to correctness. We explain certain effects and their appearance in a stereo rendered scene. Final...

this article describes an accurate subpico flowmeter bifurcatedin to liquid and gas flowrates less than 1mol/s for both mems/nems and cryogenic technology applications. the mems/nems are described as either two gauges (instrument), or quartz fluctuating forks, even if the liquid or gas flows through an element, as well as cryogenic technology consisting of arrays of either parallel photonic cry...

For advanced CMOS processes, inverse lithography promises better patterning fidelity than conventional mask correction techniques due to a more complete exploration of the solution space. However, the success of inverse lithography relies highly on customized cost functions whose design and know-how have rarely been discussed. In this paper, we investigate the impacts of various objective funct...

Liquid immersion lithography (LIL) extends the resolution of optical lithography to meet industry demands into the next decade. Through the use of exposure media such as purified water (n of 1.44 at 193 nm), it is possible to reduce minimum pitches compared with traditional air/vacuum exposures media by a factor of as much as 44%—a full technology node. Beyond this simple observation, there is ...

Earlier we reported on a proof-of-concept maskless-lithography system that used an array of Fresnel zone plates to focus multiple beams of 442 nm light onto a substrate, and micromechanics for multiplexing light to the several zone plates, enabling patterns of arbitrary geometry, at 350 nm linewidth, to be written. We referred to the technique as zone-plate-array lithography ~ZPAL!. We also dem...

Soft lithography was used to replicate nanoscale features made using electron beam lithography on a polymethylmethacrylate (PMMA) master. The PMMA masters were exposed to fluorinated silane vapors to passivate its surfaces so that polydimethylsiloxane (PDMS) did not permanently bond to the master. From scanning electron microscopy, the silanization process was found to deposit a coating on the ...

VOLUME 14, NUMBER 2, 2003 LINCOLN LABORATORY JOURNAL 221 O  ,   of patterning, has enabled semiconductor devices to progressively shrink since the inception of integrated circuits more than three decades ago. Throughout the 1980s and 1990s, the trend of miniaturization continued unabated and even accelerated. Current semiconductor devices are being mass produced wi...

Immersion interferometric lithography has been applied successfully to semiconductor device applications, but its potential is not limited to this application only. This paper explores this imaging technology for the production of threedimensional nano-structures using a 193 nm excimer laser and immersion Talbot interferometric lithographic tool. The fabrication of 3-D photonic crystals for the...

Nanoscale science and technology has today mainly focused on the fabrication of nano devices. In this paper, we study the use of lithography process to build the desired nanostructures directly. Nanolithography on polymethylmethacrylate (PMMA) surface is carried out by using Atomic Force Microscope (AFM) equipped with silicon tip, in contact mode. The analysis of the results shows that the ...

Extreme ultraviolet lithography is one of the modern lithography tools for high-volume manufacturing with 22 nm resolution and beyond. But critical challenges exist to the design and fabrication of large-scale and highly efficient diffraction transmission gratings, significantly reducing the feature sizes down to 22 nm and beyond. To achieve such a grating, the surface flatness, the line edge r...