نتایج جستجو برای: sio2 membrane

تعداد نتایج: 402821  

Journal: :Biointerphases 2017
Brittany E Givens Nina D Diklich Jennifer Fiegel Vicki H Grassian

Bovine serum albumin (BSA) adsorbed on amorphous silicon dioxide (SiO2) nanoparticles was studied as a function of pH across the range of 2 to 8. Aggregation, surface charge, surface coverage, and protein structure were investigated over this entire pH range. SiO2 nanoparticle aggregation is found to depend upon pH and differs in the presence of adsorbed BSA. For SiO2 nanoparticles truncated wi...

Journal: :Chemistry 2014
Gabriel Loget Robert M Corn

Arrays of electrodeposited silica nanowires (SiO2 NWs) have been fabricated over large areas (cm(2)) on fluoropolymer thin films attached to glass substrates by a combination of photolithography and electrochemically triggered sol-gel nanoscale deposition. Optical and scanning electron microscopy (SEM) measurements revealed that the SiO2 NW arrays had an average spacing of ten micrometers and a...

Journal: :Frontiers in immunology 2016
Gillian L. Beamer Benjamin P. Seaver Forrest Jessop David M. Shepherd Celine A. Beamer

Numerous studies have examined the relationship between alveolar macrophages (AMs) and crystalline silica (SiO2) using in vitro and in vivo immunotoxicity models; however, exactly how exposure to SiO2 alters the functionality of AM and the potential consequences for immunity to respiratory pathogens remains largely unknown. Because recognition and clearance of inhaled particulates and microbes ...

Journal: :Physical review letters 2010
W G Cullen M Yamamoto K M Burson J H Chen C Jang L Li M S Fuhrer E D Williams

High-resolution noncontact atomic force microscopy of SiO2 reveals previously unresolved roughness at the few-nm length scale, and scanning tunneling microscopy of graphene on SiO2 shows graphene to be slightly smoother than the supporting SiO2 substrate. A quantitative energetic analysis explains the observed roughness of graphene on SiO2 as extrinsic, and a natural result of highly conformal ...

1997
Carl Anderson Allen J. Bard

The characterization of mixed oxides of TiO2/SiO2 and TiO2/Al2O3 prepared by sol-gel methods is described. Application of the TiO2/Al2O3 material for the photocatalytic decomposition of salicylic acid gave improved activity relative to TiO2-only materials. The photocatalytic activity of TiO2/SiO2, TiO2/Al2O3, and TiO2 toward the photocatalytic decomposition of phenol demonstrated the enhancemen...

پایان نامه :وزارت علوم، تحقیقات و فناوری - دانشگاه سیستان و بلوچستان - دانشکده علوم پایه 1391

یک روش سنتزی برای تهیه بنزو [b] پیران و مشتقات آن با استفاده از واکنش سه جزئی مالونونیتریل، آلدهید های آروماتیک و دایمدون یا باربیتوریک اسید یا 4-هیدروکسی کومارین با استفاده از کاتالیست نانو sio2 در حلال آب شرح داده شده است .

2014
Duangdao Channei Sukon Phanichphant

The Fe3O4/CeO2 magnetic photocatalyst was prepared by coating directly onto the surface of magnetic Fe3O4 particles. However a direct contact of CeO2 onto the surface of magnetic Fe3O4 particles presented unfavorable heterojunction, thus the SiO2 barrier layer between magnetic Fe3O4 and CeO2 was prepared as a core-shell stucture to reduce the negative effect by combining three steps of the hydr...

2010
Ali Mahyar Mohammad Ali Behnajady Naser Modirshahla

SiO2-TiO2 mixed oxides have been prepared by sol-gel technique from titanium tetraisopropoxide and tetraethylorthosilicate. The prepared materials were characterized by X-ray diffraction, FT-IR spectroscopy, scanning electron microscopy, nitrogen physisorption and UV-vis diffuse reflectance spectroscopy. The results indicate that compared to pure TiO2, the SiO2-TiO2 mixed oxides show higher the...

2014
Qilu Yao Zhang-Hui Lu Zhujun Zhang Xiangshu Chen Yaqian Lan

Ultrafine copper nanoparticles (Cu NPs) within porous silica nanospheres (Cu@SiO2) were prepared via a simple one-pot synthetic route in a reverse micelle system and characterized by SEM, TEM, EDX, XRD, N2 adsorption-desorption, CO-TPD, XPS, and ICP methods. The characterized results show that ultrafine Cu NPs with diameter of around 2 nm are effectively embedded in the center of well-proportio...

2001
Da Zhang Mark J. Kushner

During fluorocarbon plasma etching of SiO2 , a polymer passivation layer is generally deposited on the surface of the wafer. The polymer layer regulates the etch by limiting the availability of activation energy and reactants, and providing the fuel for removal of oxygen. To investigate these processes, a surface reaction mechanism for fluorocarbon plasma etching of SiO2 has been developed. The...

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