chemical vapor deposition (cvd) is one of the most popular methods for producing carbon nanotubes (cnts). the growth rate of cnts based on cvd technique is investigated by using a numerical model based on finite volume method. inlet gas mixture, including xylene as carbon source and mixture of argon and hydrogen as carrier gas enters into a horizontal cvd reactor at atmospheric pressure. in thi...

Highly granular YBaCuO films on SrTlO, substrates wlth T,,,-90K and J,>lO' A/cm2 were prepared by non-vacuum aerosol deposition. The optical response for these films was investigated on a 10 x 10 pm2 mlcrobrldge. Besides a bolometrlc response around the transition temperature, a sharp response peak was observed at low temperature and high bias current using a He-Ne laser (0.63pm wavelength) lll...

The PVD techniques range over a wide variety of applications from decorative, to high temperature superconducting films. The thickness of the deposits can vary from angstroms to millimeters. A very large number of inorganic materials—metals, alloys, compounds, and mixtures—as well as some organic materials can be deposited using Physical vapour Deposition (PVD) technologies. Traditionally, the ...

The microstructure and nanomechanical properties of pure Cr coatings deposited on SiC with various physical vapor deposition (PVD) methods have been investigated for the mitigation hydrothermal corrosion SiC-SiCf (SiC fiber-reinforced matrix) composite fuel cladding in light water reactors (LWR). (4–7 ?m thick) were unbiased substrates using six variants magnetron sputtering processes: (i) stan...

An alternative approach for producing a hard TiB2/TiC multilayer on M2 high-speed steel was introduced by combining cathodic arc physical vapor deposition (CA-PVD) and reduction thermal diffusion-based boriding (CRTD-Bor). In this regard, the CRTD-Bor process applied CA-PVD Ti-deposited effects of parameters (i.e., temperatures durations) growth were examined. During boriding, Ti coating substr...

Hard and wear-resistant coatings created utilizing physical vapor deposition (PVD) techniques are extensively used in extreme tribological applications. The friction wear behavior of vary significantly with temperature, indicating that advanced coating concepts essential for prolonged load-bearing Many have recently been explored this area, including multicomponent, multilayer, gradient coating...

At the beginning of the seventies, a break-through took place in the telecommunication research. The introduction of Chemical Vapour Deposition technology in the manufacture of optical fibres allowed both technical quality and economical convenience to realise optical networks, thus beginning the telecommunication revolution. Since that moment, a great development of the CVD techniques has been...

Four thin-film adhesion characterization methods are proposed. Two of them are surface acoustic wave based and the two others emphasize the complementary nature between acoustic microscopy, scratch test and tensile experiments. A continuous wave scanning acoustic microscope was used to propagate surface modes in the specimen and to measure the surface acoustic wave velocity as a function of the...

This investigation consisted of two parts. In part one, a High Rate Physical Vapor Deposition Process was developed for the deposition of metals, alloys, compounds and dispersion strengthened alloys. The relationship between the deposition temperature, the microstructure and the mechanical properties was studied. The materials resulting from this process were shown to have oroperties very simil...