A square planar photonic crystal composed of carbon nanofibers was fabricated using e-beam lithography and chemical vapor deposition. The diffraction properties of the system were characterized experimentally and compared with theory and numerical simulations. The intensities of the (-1,0) and (-1,-1) diffraction beams were measured as functions of the angles of incidence for both s and p-polar...

We have developed large size diffraction gratings and flat mirrors for large size pulse compressor in LFEX laser system. The required size of grating is 1.8 m, and we use 2 segment system with 91 cm element gratings. The substrates of mirrors and gratings are made of newly developed fused synthetic silica glass for low thermal expansion. The coating on this fused silica substrates are made by t...

This paper analyzes the effect of polarization and incident angle on contrasts interference patterns in three-beam lithography. A non-coplanar laser system was set up to simulate relationship between contrast, beam polarization, angle. Different pattern periods require different angles, which means contrast losses Two modes were presented study effects with angles based theoretical analysis sim...

We report on a fabrication method of the hydrogenated amorphous silicon (a-Si:H) thin-film transistors (TFTs) using a maskless laser-write lithography (LWL). Level-to-level alignment with a high accuracy is demonstrated using LWL method. The obtained results show that it is possible to fabricate a-Si:H TFTs using a well-established a-Si:H TFT technology in combination with the maskless lithogra...

The development of ways to increase the intensity extreme ultraviolet (EUV) light sources for future EUV lithography is important realize high throughput fine patterning. energy-recovery linac (ERL) free-electron laser (FEL), which an accelerator based source, a candidate this. We clarify design concept ERL-FEL lithography, delivery systems FEL multiscanners, and items technologies possibility ...

A laser technology for fabricating microelectromechanical components has been developed. Using a Q-switched Nd:YAG laser with optional frequency doubling, bulk silicon wafers, silicon membranes, and thin-films deposited on different substrates are micromachined without using lithography-based technologies. Applications are for example rapid prototyping or small lot production of micromechanical...

Direct laser writing through two-photon polymerization lithography is used to fabricate 3D nanostructures containing aligned single-wall carbon nanotubes (SWCNTs). SWCNTs are aligned in the laser scanning directions while they are embedded in the structure. The alignment is induced by spatial confinement, volume shrinkage, and the optical gradient force. This method is expected to lead to new a...

Lithium containing droplet and cluster targets irradiated by laser pulses are proposed as prospective source of for soft x-ray lithography. Analytical model and simulations show that laser with repetition rate of several MHz with energy of several mJ and pulse duration 10 ps is required.