and thus alternative technologies such as extreme ultraviolet (EUV) lithography, nanoimprint lithography, interference lithography, and directed self-assembly (DSA) are emerging rapidly. [ 2 , 3 , 8–16 ] DSA of block copolymers (BCPs) has recently attracted much attention as a promising candidate for nextgeneration lithography due to its capacity to provide excellent resolution and scalability....

We report nanoscale patterning of graphene using a helium ion microscope configured for lithography. Helium ion lithography is a direct-write lithography process, comparable to conventional focused ion beam patterning, with no resist or other material contacting the sample surface. In the present application, graphene samples on Si/SiO2 substrates are cut using helium ions, with computer contro...

Nanostructuring for tailored optical functionality suffers from a lack of methods for large-area and low-cost fabrication. While electron beam lithography allows different complex shapes to be deposited onto the same substrate layer, the writing process is sequential and the fabrication is very expensive. Large-area methods, such as nanosphere lithography, [ 1 ] colloidal lithography using shad...

We designed and fabricated silicon probe with nanophotonic force sensor to directly stimulate neurons (PC12) and measured its effect on neurite initiation and elongation. A single-layer pitch-variable diffractive nanogratings was fabricated on silicon nitride probe using e-beam lithography, reactive ion etching and wet-etching techniques. The nanogratings consist of flexure folding beams suspen...

Lithography using photomasks has been the major workhorse in printed circuit boards, semiconductors, and flat panel display device manufacturing. However, the cost of photomask is so high that it often becomes the bottleneck, especially when the production volume is low. Recently, maskless lithography technology is gaining more attention, and hence, the computation of efficient lithography path...

The current nanofabrication techniques including electron beam lithography provide fabrication resolution in the nanometre range. The major limitation of these techniques is their incapability of arbitrary three-dimensional nanofabrication. This has stimulated the rapid development of far-field three-dimensional optical beam lithography where a laser beam is focused for maskless direct writing....

This paper reports the development of a low-cost, portable, light-emitting diode (LED)-based UV exposure system for photolithography. The major system components include UV-LEDs, microcontroller, digital-to-analog (D/A) converter and LED control circuitry. The UV-LED lithography system is also equipped with a digital user interface (LCD and keypad) and permits accurate electronic control on the...

UNLABELLED Since its introduction in 1995, nanoimprint lithography has been demonstrated in many researches as a simple, low-cost, and high-throughput process for replicating micro- and nanoscale patterns. Due to its advantages, the nanoimprint lithography method has been rapidly developed over the years as a promising alternative to conventional nanolithography processes to fulfill the demands...

The VLSI placement problem is to place the objects into fixed die such that there are no overlaps among the objects and some cost metric such as wire length and routability is optimized. For this purpose A new routing method is used called , A Deep sub-wavelength lithography, (using the 193nm lithography to print 45nm, 32nm, and possibly 22nm integrated circuits), is one of the most fundamental...