Advances in atomic resolution in situ environmental transmission electron microscopy for direct probing of gas-solid reactions, including at very high temperatures (approximately 2000 degrees C) are described. In addition, recent developments of dynamic real time in situ studies at the Angstrom level using a hot stage in an aberration corrected environment are presented. In situ data from Pt/Pd...

We analyze various scenarios of adaptive wave-front phase-aberration correction in optical-receiver-type systems when inhomogeneties of the wave propagation medium are either distributed along the propagation path or localized in a few thin layers remotely located from the receiver telescope pupil. Phase-aberration compensation is performed with closed-loop control architectures based on decoup...

We have extended the method of Alvarez [J. Am. Optom. Assoc. 49, 24 (1978)] to generate a variable magnitude of third-order spherical and/or coma aberration by using a combination of fourth-order plates with a magnification system. The technique, based on the crossed-cylinder aberroscope, is used to measure the wave-front aberration generated by the plates. The method has been applied to correc...

Modern transmission electron microscopes (TEM) allow utilizing the spherical aberration coefficient as an additional free parameter for optimizing resolution and contrast. By tuning the spherical aberration coefficient of the objective lens, isolated nitrogen atom columns as well as the Si–N dumbbells within the six-membered ring were imaged in b-Si3N4 along [0 0 01] and [0 0 0 1̄] projections w...

The influence of the dispersion of glass seams only relevant for femtosecond lasers with a pulse length below 100 fs. This commonly used approximation holds only for visible and IR light. For UV fs-laser Z. Bor stated out that due to the large dispersion in the UV regime fs-pulses with a duration of a few hundred femtoseconds are significantly affected in lenses by the group delay [1]. When a p...

The most commonly used configurations in digital holography-namely Fourier holograms, Fresnel holograms, and image-plane holograms-are analyzed with respect to Seidel's wave aberration theory. This analysis is performed by taking into account the phase terms involved in the recording and reconstruction processes. The combined phase term from both processes is compared with the Gaussian-referenc...

By studying treatment contrasts and ANOVA models, we propose a generalized minimum aberration criterion for comparing asymmetrical fractional factorial designs. The criterion is independent of the choice of treatment contrasts and thus model-free. It works for symmetrical and asymmetrical designs, regular and nonregular designs. In particular, it reduces to the minimum aberration criterion for ...

We performed wave-optics-based numerical simulations at mid-infrared wavelengths to investigate how the presence or absence of entrance slits and optical aberrations affect spectral resolving power $R$ a compact, high-spectral-resolving-power spectrometer containing an immersion-echelle grating. tested three cases telescope aberration (aberration-free, astigmatism spherical aberration), assumin...

As semiconductor lithography is pushed to smaller dimensions, the process yields tend to suffer due to subwavelength imaging effects. In response, resolution enhancement technologies have been employed together with optimization techniques, specifically source mask optimization (SMO), which finely tunes the process by simultaneously optimizing the source shape and mask features. However, SMO ha...