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157 ©2013 Society For Biomaterials

................................................................................................................ 157 AUTOBIOGRAPHICAL STATEMENT ......................................................................... 159

...........................................................................................................................157 Autobiographical Statement.................... ........................................................................159

Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography The aqueous base development step is one of the most critical processes in modern lithographic imaging technology. Sinusoidal modulation of the exposing light intensity must be converted to a step function in the resist film during the development process. Thus, in designing high-performance resi...