Future lithography systems must produce more dense chips with smaller feature sizes, while maintaining the throughput of one wafer per sixty seconds per layer achieved by today’s optical lithography systems. To achieve this throughput with a direct-write maskless lithography system, using 25 nm pixels for 50 nm feature sizes, requires data rates of about 10 Tb/s. In a previous paper, we present...

The end of the 19 century brought about a change in the dynamics of computing by the development of the microprocessor. Huge bedroom size computers began being replaced by portable, smaller sized desktops. Today the world is dominated by silicon, which has circumscribed chip development for computers through microprocessors. Majority of the integrated circuits that are manufactured at present a...

Nanoimprint lithography ~NIL! is a paradigm-shift method that has shown sub-10-nm resolution, high throughput, and low cost. To make NIL a next-generation lithography tool to replace conventional lithography, one must demonstrate the needed overlay accuracy in multilayer NIL, large-area uniformity, and low defect density. Here, we present the fabrication of 60-nm channel metal–oxide–semiconduct...

OVERVIEW: The minimum feature size required for the most advanced semiconductor devices is now below half the exposure wavelength, and the optical lithography technology is facing its practical resolution limit. In this article, we review the current status of DFM and issues for further miniaturization. The role and requirements of metrology technology are also discussed. The layout design has ...

Microfabrication is actually a collection of technologies which are utilized in making microdevices. Some of them have very old origins, not connected to manufacturing, like lithography or etching. Electroplating is technique adapted to produce micrometre scale structures, as are various stamping and embossing techniques. Micro-Components are required in a range of new products such as medical ...