In nanotechnology applications, nanopositioning, i.e., nanometer-scale precision control at dimensions of less than 100 nm, plays a central role. One can view nanopositioners as precision mechatronics systems aiming at moving objects over a certain distance with a resolution that could be as low as a fraction of an Ångström. Actuation, position sensing and feedback control are the key component...

Suspended nanotubes or nanowires can be used in line-of-sight depositions to produce nanometre-scale lines. Reported here is the experimental quantification of line-of-sight shadow widths for multiwalled carbon nanotubes that are suspended (400 nm) over a silicon nitride (Si3N4) membrane (transmission electron microscopy) TEM grid by a lithographically defined resist line array. Aluminium evapo...

Scotland, United Kingdom Photonic band gap (PBG) devices have been used to improve optoelectronic device performance through modi cation of spontaneous emission, and are currently of much interest due to the control of the photonic state which incorporated defects can provide. The concept of defect localized photon states has led to the design of structures that guide light on the nanometer sca...

We report a new lithography technique based on electromigration driven material transport for drawing patterns at nanometer scales in ambient conditions. We use a thin metal film as a masking layer and a polymer layer beneath it as a pattern transfer layer. The desired pattern is drawn in the metal layer by etching the metal with a conducting scanning probe assisted by liquid electromigration. ...

Exploring the resolution limit of electron-beam lithography is of great interest both scientifically and technologically. However, when electron-beam lithography approaches its resolution limit, imaging and metrology of the fabricated structures by using standard scanning electron microscopy become difficult. In this work, the authors adopted transmission-electron and atomic-force microscopies ...

Nanoimprint lithography technologies (NIL), introduced by Chou et al. in 1995 [1], may be used to overcome the feature size limitation encountered in classical photolithography while remaining more economical than lithographies based on electron, ion beam, x-ray, and scanning probe tips. In the approach involving hot-embossing of a thermoplastic resist layer, a sub-10nm [2] resolution has been ...

The combination of electron beam lithography and gold nanoparticle-based detection method is subject to a novel high-resolution approach to detecting DNA nanoarrays. In this work, gold nanoparticle-based detection of DNA hybridization on nanostructured arrays is presented. The nanostructured arrays were created by electron beam lithography of a self-assembled monolayer. Amine groups, which are ...

Soft lithography was used to replicate nanoscale features made using electron beam lithography on a polymethylmethacrylate (PMMA) master. The PMMA masters were exposed to fluorinated silane vapors to passivate its surfaces so that polydimethylsiloxane (PDMS) did not permanently bond to the master. From scanning electron microscopy, the silanization process was found to deposit a coating on the ...