An Object Oriented Particle-in-Cell model of a plasma glow discharge in a cylindrical magnetron cleaning device has been developed to provide guidance in developing a novel in situ surface conditioning technique. The model tracks the trajectories of particles by solving the equations of motion and the electrostatic field equations. Simulation results are compared to experimental measurements ob...

The corrosion behavior of TiN coated 316L stainless steel in an artificial physiological solution was investigated by means of an electrochemical test. Two different PVD methods were used for film deposition: cathodic arc and reactive magnetron sputtering. The dependence of the corrosion resistance on the main deposition parameters (nitrogen pressure, substrate bias) was analyzed. For a better ...

Synopsis. A slotted surface coil, inspired on the cavity magnetron was developed for magnetic resonance imaging (MRI) at 4T. Imaging tests using a saline phantom demonstrated that the slotted surface coil has deeper RF-sensitivity than the single-loop RF-coil. High quality images of two rats were acquired simultaneously using standard spin-echo pulse sequences, demonstrating that the slotted su...

Amorphous Ni–Ag films were obtained on liquid nitrogen cooled Si substrates using DC magnetron sputtering. A series of magnetic and magneto-transport property measurements confirm that the film with Ni to Ag atomic ratio of 60:40 is an alloy of the two elements immiscible in equilibrium, with atomic-level intermixing. The magnetic properties of the new alloy are discussed in comparison with tho...

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The structure and nanoscale mechanical properties of Ni48.8Mn27.2Ga24 thin film fabricated by DC magnetron sputtering are investigated systematically. The thin film has the austenite state at room temperature with the L21 Hesuler structure. During nanoindentation, stress-induced martensitic transformation occurs on the nanoscale for the film annealed at 823 K for 1 hour and the shape recovery r...

We investigate the complexity of reactive sputtering highly conductive zinc oxide thin films in presence hydrogen at room temperature. report on importance precise geometric positioning substrate with respect to magnetron achieve maximum conductivity. examine electrical properties deposited thins based their position holder relative magnetron. By considering early reports by other researchers a...

Copper films of 300 nm thickness deposited by planar magnetron sputtering on glass substrates, for substrate temperatures between 300 and 500 K, and deposition rate of 10 ?s?1. Microstructure of these films was obtained by X-ray diffraction, while the texture mode of diffractometer was used for stress measurement by the sin2? technique. The components of the stress tensor are obtained using mea...

This work presents a proposed mechanism for fabricating Y-shaped nanorods, demonstrates the feasibility of the proposal through classical molecular dynamics simulations, and validates the simulations through magnetron sputter deposition experiments. The proposed mechanism relies primarily on the formation of stacking faults during deposition and to a lesser degree on diffusion kinetics and geom...