In this combined theoretical and experimental study, we report the effects of Al precursor selection on growth chemistry, interfacial structure, electrochemistry Al2O3 coatings spinel LiMn2O4 (LMO) surfaces by atomic layer deposition (ALD). Five precursors, exhibiting a range Lewis acid–base properties, were used to establish trends in ALD chemistry LMO powders comparison redox-inactive planar ...