The efficiency of a coherent VUV source at 125 nm, based on 2-photon resonant four-wave mixing in mercury vapor, has been enhanced by up to 2 orders of magnitude. This enhancement was obtained by locally heating a liquid Hg surface with a pulsed excimer laser, resulting in a high density vapor plume in which the nonlinear interaction occurred. Energies up to 5 μJ (1 kW peak power) have been ach...

Well-ordered silicon nanowires (SiNWs) are applied as surface-enhanced Raman scattering (SERS) substrates. Laser interference lithography is used to fabricate large-area periodic nanostructures. By controlling the reaction time of metal assisted chemical etching, various aspect ratios of SiNWs are generated. Ag nanoparticles are decorated on the substrates via redox reaction to allow a good cov...

Anchorage-dependent cells growing over a substratum require stable adhesion areas on the surface for the next cellular activities. The adhesion is achieved by some contact points called focal adhesions. Because focal adhesions were distributed randomly, a trial to control the positions of focal adhesion with a specific order may cause interesting effects like as cytoskeleton rearrangement, whic...

Laser speckle pattern is a granular structure formed due to random coherent wavelet interference and generally considered as noise in optical systems including photolithography. Contrary to this, in this paper, we use the speckle pattern to generate predictable and controlled Gaussian random structures and quasi-random structures photo-lithographically. The random structures made using this pro...

This article presents an effective approach for patterned growth of vertically aligned ZnO nanowire (NW) arrays with high throughput and low cost at wafer scale without using cleanroom technology. Periodic hole patterns are generated using laser interference lithography on substrates coated with the photoresist SU-8. ZnO NWs are selectively grown through the holes via a low-temperature hydrothe...

In this article, we present our study on surface plasmon SP assisted contact scheme nanoscale photolithography technique. Sub-100-nm features on a metallic mask, fabricated by e-beam lithography, were successfully transferred to a resist pattern in a setup close to traditional photolithography. Our previous work based on finite difference time domain simulation reveals the mechanism of SP-light...

In semiconductor lithography, glass masks are illuminated with deep UV laser light and their image is reduced through a lens onto the substrate to define circuitry. As feature sizes are pushed towards 100 nm and smaller, lithography systems and masks are becoming increasingly complex and costly (~$1 million per mask set). In addition, the delay in obtaining a mask set, with complex optical-prox...

Generation of Bessel-like beam array from polymeric microstructures, which were created using four-beam interference lithography is demonstrated. Quality of the produced Bessel-like beams depends on the geometrical parameters of the manufactured axicon-like structures, and their shape can be efficiently controlled through the laser treatment parameters. The output beam characteristics indicate ...

Inorganic micro®ltration membranes with a pore size down to 0.1 mm have been made using laser interference lithography and silicon micro machining technology. The membranes have an extremely small ̄ow resistance due to a thickness smaller than the pore size, a high porosity and a very narrow pore size distribution. They are relatively insensible to fouling, because they have a smooth surface, s...

Nano-fabrication technologies for patterned structures made from thin films are reviewed. A classification is made to divide the patterning technologies in two groups namely with and without the using a mask. The more traditional methods as well as a few new methods are discussed al in relation with the application. As mask less methods we discussed direct patterning with ions including FIB, na...