نتایج جستجو برای: humor styles questionnaire hsq by martin

تعداد نتایج: 7155293  

Journal: :International Journal of Educational Leadership and Management 2019

Journal: :Humor: International Journal of Humor Research 2021

Abstract A correlational study ( n = 180 adults) in the United States tested hypothesis that self-directed humor styles predict emotional responses to COVID-19, specifically stress and hopelessness, turn engagement protective behaviors. Results from a sequential mediation analysis supported our hypotheses. First, extent people have self-enhancing style they perceived less hopelessness associate...

Journal: :Nanoscale 2014
Hiroshi Sugimoto Minoru Fujii Kenji Imakita

We present a new route for mass-production of B and P codoped all-inorganic colloidal Si nanocrystals (NCs) from hydrogen silsesquioxane (HSQ). Codoped Si NCs are grown in glass matrices by annealing mixture solutions of HSQ and dopant acids, and then extracted from the matrices by hydrofluoric acid etching. The free-standing NCs are dispersible in methanol without any surface functionalization...

2009
Debbie Morecroft Joel K. W. Yang S. Schuster Karl K. Berggren Qiangfei Xia Wei Wu Stanley Williams

This work addresses the challenges in fabricating sub-10 nm sized features, dense sub-15 nm half-pitch arbitrary-pattern nanoimprint molds, as well as pattern transfer of the molds using nanoimprint. The molds were fabricated using an optimized electron-beam lithography process with hydrogen silsesquioxane HSQ resist. Two different mold-processing routes were investigated: 1 HSQ patterns on top...

2010
Huigao Duan Donald Winston Joel K. W. Yang Bryan M. Cord Vitor R. Manfrinato Karl K. Berggren

Developing high-resolution resists and processes for electron-beam lithography is of great importance for high-density magnetic storage, integrated circuits, and nanoelectronic and nanophotonic devices. Until now, hydrogen silsesquioxane HSQ and calixarene were the only two reported negative resists that could approach sub-10-nm half-pitch resolution for electron-beam lithography. Here, the aut...

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